1
Deodatta Shenai-Khatkhate
Woelk Egbert, Shenai Khatkhate Deodatta Vina: Germanium compounds suitable for use in vapor deposition processes. Rohm & Haas Elect Materials, October 6, 2004: EP1464725-A2 (7 worldwide citation)

Germanium compounds suitable for use as vapor phase deposition precursors for germanium films are provided. Methods of depositing films containing germanium using such compounds are also provided. Such germanium films are particularly useful in the manufacture of electronic devices.


2
Deodatta Shenai-Khatkhate
Shenai Khatkhate Deodatta Vina, Li Huazhi, Wang Qing Min: Organometallic compounds. Rohm & Haas Elect Materials, December 10, 2008: EP2000561-A1 (4 worldwide citation)

Heteroleptic organometallic compounds containing at least one formamidinate ligand are provided. These heteroleptic organometallic compounds have improved properties over conventional vapor deposition precursors. Such compounds are suitable for use as vapor deposition precursors including direct liq ...


3
Deodatta Shenai-Khatkhate
Lipiecki Francis Joseph, Maroldo Stephen Gerard, Shenai Khatkhate Deodatta Vina, Ware Robert A: Method of preparing organometallic compounds. Rohm & Haas, February 4, 2009: EP2020258-A2 (2 worldwide citation)

A method of preparing an ultra-pure organometallic compound comprising using a microchannel device for synthesis in reacting a metal halide with an alkylating agent to produce an ultra-pure alkylmetal compound for processes such as chemical vapor deposition.


4
Deodatta Shenai-Khatkhate
Lipiecki Francis Joseph, Maroldo Stephen Gerard, Shenai Khatkhate Deodatta Vina, Ware Robert A: Purification process using microchannel devices. Rohm & Haas, February 4, 2009: EP2020257-A2 (1 worldwide citation)

This invention relates to methods of removing impurities from compounds having similar volatilities to form ultra high purity compounds.


5
Deodatta Shenai-Khatkhate
DIXIT RAVINDRA S, BAI HUA, MODTLAND CURTIS D, WARE ROBERT A, PENDERGAST JR JOHN G, CHRISTENSON CHRISTOPHER P, SHENAI KHATKHATE DEODATTA VINAYAK, AMAMCHYAN ARTASHES, CROUCH KENNETH M, POLCARI ROBERT F: [fr] Préparation de composés organométalliques, [de] Organometallische Verbindungszubereitung, [en] Organometallic compound preparation. ROHM & HAAS ELECT MATERIALS, Dow Global Technologies, February 20, 2013: EP2559682-A2

[en] A method of continuously manufacturing organometallic compounds is provided where two or more reactants are conveyed to a reactor having a laminar flow contacting zone, a heat transfer zone, and a mixing zone having a turbulence-promoting device. and causing the reactants to form the organometa ...


6
Deodatta Shenai-Khatkhate
WANG QING MIN, SHENAI KHATKHATE DEODATTA VINAYAK, LI HUAZHI: Organometallic compounds, Organometallische Verbindungen, Composés organométalliques. ROHM & HAAS ELECT MATERIALS, June 29, 2011: EP2339048-A1

Methods of vapor depositing metal-containing films using certain organometallic compounds containing a carbonyl-containing ligand are disclosed.


7
Deodatta Shenai-Khatkhate
LIPIECKI FRANCIS J, MAROLDO STEPHEN G, WARE ROBERT A, SHENAI KHATKHATE DEODATTA VINAYAK: Method of preparing organometallic compounds, Verfahren zur Herstellung von organometallischen Verbindungen, Procédé de préparation de composés organométalliques. Rohm & Haas, August 24, 2011: EP2359923-A1

A process for preparing a metal alkyl compound comprising reacting a metal halide solution with an alkylmetal solution in a microchannel device or purifying an organometallic metal in a microchannel device. The metal alkyl compounds prepared by the process may have reduced impurities rendering them ...


8
Deodatta Shenai-Khatkhate
LIPIECKI FRANCIS J, MAROLDO STEPHEN G, WARE ROBERT A, SHENAI KHATKHATE DEODATTA VINAYAK: Method of preparing organometallic compounds, Verfahren zur Herstellung von organometallischen Verbindungen, Procédé de préparation de composés organométalliques. Rohm & Haas, August 24, 2011: EP2359922-A1

A method of preparing an ultra-pure metal amidinate compound comprising using a microchannel device for synthesis in reacting a metal halide solution with a lithium amidinate solution to produce an ultra-pure alkylmetal compound for processes such as chemical vapor deposition.


9
Deodatta Shenai-Khatkhate
Shenai Khatkhate Deodatta Vina, Dicarlo Ronald L Jr: Improved method for purifying organometallic compounds. Rohm & Haas Elect Materials, May 23, 2007: GB2432364-A

A method of purifying an organometallic compound comprising i) providing a mixture comprising a) an organometallic compound chosen from unsymmetrical dimethyl hydrazine and a compound of the formula RRn-1M wherein R is chosen from (C1-C20)alkyl, (C2-C12)dialkylamino, (C1-C12)alkylamino(C1-C12)alkyl, ...


10
Deodatta Shenai-Khatkhate
Shenai khatkhate Deodatta Vinayak, Manzik Stephen J, Wang Qing Min: Precursor compositions and methods. Rohm & Haas Elect Materials, Chen Zhefeng, May 27, 2009: CN200810173784

Compositions including an amido-group-containing vapor deposition precursor and a stabilizing additive are provided. Such compositions have improved thermal stability and increased volatility as compared to the amido-group-containing vapor deposition precursor itself. These compositions are useful i ...