1
Ana Londergan
Ana R Londergan, Bangalore R Natarajan, Evgeni Gousev, James Randolph Webster, David Heald: MEMS cavity-coating layers and methods. Qualcomm Mems Technologies, Knobbe Martens Olson & Bear, June 8, 2010: US07733552 (12 worldwide citation)

Devices, methods, and systems comprising a MEMS device, for example, an interferometric modulator, that comprises a cavity in which a layer coats multiple surfaces. The layer is conformal or non-conformal. In some embodiments, the layer is formed by atomic layer deposition (ALD). Preferably, the lay ...


2
Ana Londergan
Ana R Londergan, Bangalore R Natarajan, Evgeni Gousev, James Randolph Webster, David Heald: MEMS cavity-coating layers and methods. Qualcomm Mems Technologies, Knobbe Martens Olson & Bear, April 24, 2012: US08164815 (4 worldwide citation)

Devices, methods, and systems comprising a MEMS device, for example, an interferometric modulator, that comprises a cavity in which a layer coats multiple surfaces. The layer is conformal or non-conformal. In some embodiments, the layer is formed by atomic layer deposition (ALD). Preferably, the lay ...


3
Ana Londergan
Khurshid Syed Alam, Evgeni Gousev, Marc Maurice Mignard, David Heald, Ana R Londergan, Philip Don Floyd: Equipment and methods for etching of MEMS. QUALCOMM MEMS Technologies, Knobbe Martens Olson & Bear, September 17, 2013: US08536059 (1 worldwide citation)

Etching equipment and methods are disclosed herein for more efficient etching of sacrificial material from between permanent MEMS structures. An etching head includes an elongate etchant inlet structure, which may be slot-shaped or an elongate distribution of inlet holes. A substrate is supported in ...


4
Ana Londergan
Ana R Londergan, Bangalore R Natarajan, Evgeni Gousev, James Randolph Webster, David Heald: Mems cavity-coating layers and methods. Qualcomm Mems Technologies, August 16, 2012: US20120206462-A1

Devices, methods, and systems comprising a MEMS device, for example, an interferometric modulator, that comprises a cavity in which a layer coats multiple surfaces. The layer is conformal or non-conformal. In some embodiments, the layer is formed by atomic layer deposition (ALD). Preferably, the lay ...


5
Ana Londergan
Ana R Londergan, Bangalore R Natarajan, Evgeni Gousev, James Randolph Webster, David Heald: Mems cavity-coating layers and methods. Qualcomm Mems Technologies, Knobbe Martens Olson & Bear, September 30, 2010: US20100245979-A1

Devices, methods, and systems comprising a MEMS device, for example, an interferometric modulator, that comprises a cavity in which a layer coats multiple surfaces. The layer is conformal or non-conformal. In some embodiments, the layer is formed by atomic layer deposition (ALD). Preferably, the lay ...


6
Ana Londergan
Ion Bita, Evgeni Gousev, Ana Londergan, Xiaoming Yan: Etching processes used in mems production. Qualcomm MEMS Technologies, Knobbe Martens Olson & Bear, April 23, 2009: US20090101623-A1

The efficiency of an etching process may be increased in various ways, and the cost of an etching process may be decreased. Unused etchant may be isolated and recirculated during the etching process. Etching byproducts may be collected and removed from the etching system during the etching process. ...


7
Ana Londergan
Khurshid Syed Alam, Evgeni Gousev, Marc Maurice Mignard, David Heald, Ana R Londergan, Philip Don Floyd: Equipment and methods for etching of mems. Qualcomm Mems Technologies, Knobbe Martens Olson & Bear, September 2, 2010: US20100219155-A1

Etching equipment and methods are disclosed herein for more efficient etching of sacrificial material from between permanent MEMS structures. An etching head includes an elongate etchant inlet structure, which may be slot-shaped or an elongate distribution of inlet holes. A substrate is supported in ...


8
Wen Jian Lin, Hsiung Kuang Tsai: Method for fabricating an interference display unit. Qualcomm MEMS Technologies, Knobbe Martens Olson & Bear, April 3, 2007: US07198973 (116 worldwide citation)

A method for fabricating an interference display unit is provided. A first plate and a sacrificial layer are formed in order on a substrate and at least two openings are formed in the first plate and the sacrificial layer. A photoresist layer is spin-coated on the sacrificial layer and fills the ope ...


9
Wen Jian Lin, Hung Huei Hsu, Hsiung Kuang Tsai: Optical-interference type display panel and method for making the same. Qualcomm Mems Technologies, Knobbe Martens Olson & Bear, February 6, 2007: US07172915 (81 worldwide citation)

An optical-interference type display panel and a method for making the same are disclosed, wherein the display panel has a substrate on which multiple first conductive optical film stacks, supporting layers and multiple second conductive optical film stacks are formed. The substrate further has a pl ...


10
Jeffrey B Sampsell: Methods and devices for lighting displays. QUALCOMM MEMS Technologies, Knobbe Martens Olson & Bear, July 6, 2010: US07750886 (72 worldwide citation)

Various devices and methods of lighting a display are disclosed. In one embodiment, for example, a display device includes a transmissive display configured to be illuminated through a back surface and a reflective display configured to be illuminated through a front surface. A light source is dispo ...