1
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, November 29, 2005: US06969539 (46 worldwide citation)

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris-(ter-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


2
Dr. Jill S. Becker
Roy G Gordon, Jill S Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale & Dorr, March 24, 2009: US07507848 (8 worldwide citation)

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


3
Dr. Jill S. Becker
Roy G Gordon, Seigi Suh, Jill Becker: Vapor deposition of tungsten nitride. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale & Dorr, July 14, 2009: US07560581 (3 worldwide citation)

Tungsten nitride films were deposited on heated substrates by the reaction of vapors of tungsten bis(alkylimide)bis(dialkylamide) and a Lewis base or a hydrogen plasma. For example, vapors of tungsten bis(tert-butylimide)bis(dimethylamide) and ammonia gas supplied in alternate doses to surfaces heat ...


4
Dr. Jill S. Becker
Roy Gerald Gordon, Jill S Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, September 17, 2013: US08536070

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


5
Dr. Jill S. Becker
Roy G Gordon, Jill S Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, December 18, 2012: US08334016

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


6
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. President And Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, August 30, 2011: US08008743

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


7
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, February 2, 2012: US20120028478-A1

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


8
Dr. Jill S. Becker
Roy G Gordon, Seigi Suh, Jill Becker: Vapor deposition of tungsten nitride. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale And Dorr, June 15, 2006: US20060125099-A1

Tungsten nitride films were deposited on heated substrates by the reaction of vapors of tungsten bis(alkylimide)bis(dialkylamide) and a Lewis base or a hydrogen plasma. For example, vapors of tungsten bis(tert-butylimide)bis(dimethylamide) and ammonia gas supplied in alternate doses to surfaces heat ...


9
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. President and fellows of Harvard College, Wilmer Cutler Pickering Hale And Dorr, May 26, 2005: US20050112282-A1

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


10
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale And Dorr, December 15, 2005: US20050277780-A1

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...



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