1
Poon Alex Ka Tim, Kho Leonard Wai Fung: Apparatus and method for providing fluid for immersion lithography. Nikon Corporation, Poon Alex Ka Tim, Kho Leonard Wai Fung, COSTANTINO Mario A, March 17, 2005: WO/2005/024517 (577 worldwide citation)

Embodiments of the present invention are directed to a system and a method of controlling the fluid flow and pressure to provide stable conditions for immersion lithography. A fluid is provided in a space (34) between the lens (22) and the substrate (16) during the immersion lithography process. Flu ...


2
Poon Alex Ka Tim, Kho Leonard Wai Fung: Apparatus and method for providing fluid for immersion lithography. Nikon Corporation, Poon Alex Ka Tim, Kho Leonard Wai Fung, COSTANTINO Mario A, November 24, 2005: WO/2005/111722 (254 worldwide citation)

An apparatus and method are disclosed for providing fluid for immersion lithography. Immersion fluid is injected into an inner cavity (34) in a direction that is different than a direction in which the nozzle (20) moves. The immersion fluid can also be injected at different rates into the inner cavi ...


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Poon Alex Ka Tim, Kho Leonard Wai Fung, Keswani Gaurav, Coon Derek: Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine. Nikon Corporation, Poon Alex Ka Tim, Kho Leonard Wai Fung, Keswani Gaurav, Coon Derek, COSTANTINO Mario, September 25, 2008: WO/2008/115372

Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate ...


5
Poon Alex Ka Tim, Kho Leonard Wai Fung, Keswani Gaurav, Coon Derek: Immersion lithography system and method having an immersion fluid confinement plate for submerging the substrate. Nikon Corporation, Poon Alex Ka Tim, Kho Leonard Wai Fung, Keswani Gaurav, Coon Derek, COSTANTINO Mario, December 21, 2007: WO/2007/145725

A lithography apparatus (10) having a fluid confinement plate (24), which completely submerges the imaging surface of a substrate (16) is disclosed A gap, filled with immersion fluid, is provided between the imaging surface of the substrate (16) and the last optical element (20) of the projection op ...


6
Novak Thomas W, Binnard Michale B, Poon Alex Ka Tim, Totsu Masahiro, Kho Leonard Wai Fung, Keswani Gaurav: Exposure apparatus that includes a phase change circulation system for movers. Nikon Corporation, Novak Thomas W, Binnard Michale B, Poon Alex Ka Tim, Totsu Masahiro, Kho Leonard Wai Fung, Keswani Gaurav, SHIGA Masatake, January 10, 2008: WO/2008/004646

A mover combination (226) for moving and positioning a device (34) includes a mover (328) that defines a fluid passageway (370) and a circulation system (330) having a passageway inlet (374) and a passageway outlet (376). The circulation system (330) directs a circulation fluid (378) into the fluid ...