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Omura Yasuhiro, Ikezawa Hironori, Williamson David M: Projection optical system and method for photolithography and exposure apparatus and method using same. Nikon Corporation, Omura Yasuhiro, Ikezawa Hironori, Williamson David M, HASEGAWA Yoshiki, March 4, 2004: WO/2004/019128 (891 worldwide citation)

Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path befo ...


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Omura Yasuhiro: (Ja) 投影光学系、露光装置及び露光方法, (En) Projection optical system, and exposure apparatus and exposure method. Nikon Corporation, Omura Yasuhiro, HASEGAWA Yoshiki, December 9, 2004: WO/2004/107011 (135 worldwide citation)

(EN) A projection optical system of reflection/refraction type having an image forming ability thanks to favorable correction of the aberrations such as color aberration and field curvature, having a favorably reduced reflection loss at the reflective surfaces, and having a large effective image-sid ...


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Omura Yasuhiro, Ikezawa Hironori, Ishida Kumiko: (Ja) 投影光学系、露光装置、および露光方法, (En) Projection optical system, exposure apparatus, and exposure method. Nikon Corporation, Omura Yasuhiro, Ikezawa Hironori, Ishida Kumiko, YAMAGUCHI Takao, November 11, 2004: WO/2004/097911 (37 worldwide citation)

(EN) An exposure apparatus for high-resolution projection exposure with a high throughput by using an easily producible projection optical system of refraction type and a mask having an ordinal size, disposing a high refractive index medium in the optical path between the projection optical system a ...


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Omura Yasuhiro: (Ja) 投影光学系、露光装置、および露光方法, (En) Projection optical system, exposure apparatus and exposure method. Nikon Corporation, Omura Yasuhiro, YAMAGUCHI Takao, November 16, 2006: WO/2006/121008 (26 worldwide citation)

(EN) An immersion projection optical system which maintains excellent image forming performance by preventing a liquid (immersion liquid) from entering into the optical system. The projection optical system projects a reduced image, which is on a first plane, on a second plane through the liquid. Th ...


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Omura Yasuhiro: (Ja) 反射屈折結像光学系、露光装置、およびデバイスの製造方法, (En) Cata-dioptric imaging system, exposure device, and device manufacturing method. Nikon Corporation, Omura Yasuhiro, YAMAGUCHI Takao, August 2, 2007: WO/2007/086220 (25 worldwide citation)

(EN) Provided is a cata-dioptric imaging system of a highly numerical aperture, which has its various aberrations satisfactorily corrected by using neither a reflecting surface having an aspherical shape of a high order nor a reciprocal optical element. The cata-dioptric imaging system forms the ima ...


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Ikezawa Hironori, Kudo Yuji, Omura Yasuhiro: (Ja) 投影光学系、露光装置、および露光方法, (En) Projection optical system, exposure system, and exposure method. Nikon Corporation, Ikezawa Hironori, Kudo Yuji, Omura Yasuhiro, YAMAGUCHI Takao, August 3, 2006: WO/2006/080212 (23 worldwide citation)

(EN) An immersion type projection optical system capable of constantly preventing the outflow of immersion liquid into the interior of the optical system and maintaining a good imaging performance, wherein a light path between a light transmitting member (Lp) disposed closest to a second surface (W) ...


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Omura Yasuhiro, Okada Takaya, Nagasaka Hiroyuki: (Ja) 投影光学系、露光装置、および露光方法, (En) Projection optical system, exposure apparatus and exposure method. Nikon Corporation, Omura Yasuhiro, Okada Takaya, Nagasaka Hiroyuki, YAMAGUCHI Takao, November 16, 2006: WO/2006/121009 (22 worldwide citation)

(EN) A range wherein a liquid (immersion liquid) exists is reduced in an image space, for instance, in a catadioptric and off-axis field type immersion projection optical system. The projection optical system which projects a reduced image, which is on a first plane, on a second plane through the li ...


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Ikezawa Hironori, Omura Yasuhiro: (Ja) 投影光学系、露光装置、および露光方法, (En) Projection optical system, exposure system, and exposure method. Nikon Corporation, Ikezawa Hironori, Omura Yasuhiro, YAMAGUCHI Takao, April 27, 2006: WO/2006/043457 (21 worldwide citation)

(EN) An immersion type projection optical system capable of replacing an immersed parallel flat plate with the laser resistance of a boundary lens kept at a sufficiently high level and without practically causing a decrease in imaging performance. The projection optical system comprises a first ligh ...


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Omura Yasuhiro: (Ja) 反射屈折結像光学系、露光装置、およびデバイス製造方法, (En) Catadioptric imaging system, exposure device, and device manufacturing method. Nikon Corporation, Omura Yasuhiro, YAMAGUCHI Takao, August 16, 2007: WO/2007/091463 (19 worldwide citation)

(EN) Provided is a catadioptric imaging system having an effective imaging region of a shape appropriate for a package type exposure device and a high numerical aperture having a small absolute value of a magnification. The catadioptric imaging system includes: a first image forming system (G1) of r ...


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Kobayashi Naoyuki, Owa Soichi, Hirukawa Shigeru, Omura Yasuhiro: (Ja) 露光装置、露光方法及びデバイス製造方法, (En) Exposure apparatus, exposure method, and device producing method. Nikon Corporation, Kobayashi Naoyuki, Owa Soichi, Hirukawa Shigeru, Omura Yasuhiro, KAWAKITA Kijuro, August 18, 2005: WO/2005/076324 (18 worldwide citation)

(EN) An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus (EX) has a substrate holder (PH) for holding the substrate (P), a substrate stage (PST) capable of moving the substrate (P) held by the substrat ...