1
Nagasaka Hiroyuki, Okuyama Takeshi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nikon Engineering, Nagasaka Hiroyuki, Okuyama Takeshi, SHIGA Masatake, January 20, 2005: WO/2005/006415 (89 worldwide citation)

(EN) An exposure apparatus is disclosed wherein an exposure of a substrate is carried out by forming an immersion region on a part of the substrate and projecting a pattern image onto the substrate through a liquid which forms the immersion region and a projection optical system. The exposure appara ...


2
Nagasaka Hiroyuki, Okuyama Takeshi: (Ja) 露光装置、露光方法及びデバイス製造方法, (En) Exposure equipment, exposure method and device manufacturing method. Nikon Corporation, Nikon Engineering, Nagasaka Hiroyuki, Okuyama Takeshi, KAWAKITA Kijuro, December 22, 2005: WO/2005/122221 (25 worldwide citation)

(EN) Exposure equipment (EX) exposes a board (P) by irradiating the board (P) with exposure light (EL) through a projection optical system (PL) and a liquid (LQ). The exposure equipment (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ ...


3
Kohno Hirotaka, Okuyama Takeshi, Nagasaka Hiroyuki, Nakano Katsushi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nikon Engineering, Kohno Hirotaka, Okuyama Takeshi, Nagasaka Hiroyuki, Nakano Katsushi, KAWAKITA Kijuro, August 3, 2006: WO/2006/080516 (6 worldwide citation)

(EN) Disclosed is an exposure apparatus (EX) comprising a recovery port (22) for recovering a liquid (LQ), a blow port (32) arranged on the outer side of the recovery port (22) with respect to an optical path space (K1) for blowing a gas therethrough, and an exhaust vent (42) arranged between the re ...


4
Nishii Yasufumi, Nagasaka Hiroyuki, Okuyama Takeshi: Liquid recovery system and immersion exposure apparatus. Nikon Corporation, Nishii Yasufumi, Nagasaka Hiroyuki, Okuyama Takeshi, SHIGA Masatake, October 2, 2008: WO/2008/117808

A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate (14A) that has a first surface (52) and a second surface (51) on the side opposite the first surface; and a liquid recovery part (40), at least part of which opposes the second surface ...