1
Novak Thomas W, Hazelton Andrew J, Watson Douglas C: Environmental system including a transport region for an immersion lithography apparatus. Nikon Corporation, Novak Thomas W, Hazelton Andrew J, Watson Douglas C, COSTANTINO Mario A, October 28, 2004: WO/2004/092833 (572 worldwide citation)

An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), and a transport region (256). The fluid barrier (254) is positioned near the device (30) and maintains the tr ...


2
Novak Thomas W: Run-off path to collect liquid for an immersion lithography apparatus. Nikon Corporation, Novak Thomas W, COSTANTINO Mario A, October 28, 2004: WO/2004/093160 (552 worldwide citation)

An exposure apparatus (10) for transferring an image to a device (30) includes an optical assembly (16), an immersion fluid system (252), and a device stage assembly (20). The optical assembly (16) is positioned a gap (246) above the device (30). The immersion fluid system (252) fills the gap (246) ...


3
Coakley Scott, Novak Thomas W, Watson Douglas C, Phillips Alton H: Kinematic chucks for reticles and other planar bodies. Nikon Corporation, Coakley Scott, Novak Thomas W, Watson Douglas C, Phillips Alton H, SHIGA Masatake, November 27, 2008: WO/2008/143327

Devices are disclosed for holding and moving a planar body such as a reticle (25) as used, for example, in microlithography. An exemplary device includes a stage (12) and a body chuck (10). The stage has a movable support surface (17a, 17b). A proximal region (18a, 18b) of a first membrane (16a, 16b ...


4
Novak Thomas W, Binnard Michale B, Poon Alex Ka Tim, Totsu Masahiro, Kho Leonard Wai Fung, Keswani Gaurav: Exposure apparatus that includes a phase change circulation system for movers. Nikon Corporation, Novak Thomas W, Binnard Michale B, Poon Alex Ka Tim, Totsu Masahiro, Kho Leonard Wai Fung, Keswani Gaurav, SHIGA Masatake, January 10, 2008: WO/2008/004646

A mover combination (226) for moving and positioning a device (34) includes a mover (328) that defines a fluid passageway (370) and a circulation system (330) having a passageway inlet (374) and a passageway outlet (376). The circulation system (330) directs a circulation fluid (378) into the fluid ...


5
Novak Thomas W, Binnard Michael B: Apparatus and method for exposing adjacent sites on a substrate. Nikon Corporation, Novak Thomas W, Binnard Michael B, Shiga Masatake, December 17, 2009: WO/2009/151154

An exposure apparatus (10) for transferring a mask pattern (352) from a mask (12) to a substrate (14) includes an illumination system (18), a mask stage assembly (22), a substrate stage assembly (24), and a control system (28). The substrate (14) includes a first site (1) and a second site (2) that ...