1
Hirukawa Shigeru, Suwa Kyoichi, Murakami Seiro, Nei Masahiro: Projection exposure method and projection aligner. Nippon Kogaku, September 27, 2000: EP1039511-A1 (357 worldwide citation)

A projection alignment apparatus in which a rectangular illumination region (21R) on a reticle (R) is illuminated with exposure light from an exposure light source (1), and while a pattern in the illuminated region (21R) is projected through a projection optical system (PL) onto a rectangular exposu ...


2
Toshikazu Umatate, Hiroyuki Suzuki: Method for successive alignment of chip patterns on a substrate. Nippon Kogaku, Shapiro and Shapiro, October 25, 1988: US04780617 (318 worldwide citation)

A method for successive alignment of each of a plurality of chip patterns regularly arranged on a substrate to a reference position comprises moving the substrate so as to successively make selected chip patterns correspond to the reference position in accordance with design data representative of t ...


3
Suwa Kyoichi: Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus. Nippon Kogaku, April 8, 1998: EP0834773-A2 (277 worldwide citation)

Improvements in a focusing apparatus having an objective optical system for optically manufacturing a workpiece, forming a desired pattern on a surface of a workpiece or inspecting a pattern on a workpiece and used to adjust the state of focusing between the surface of the workpiece and the objectiv ...


4
Toshio Matsuura, Kyoichi Suwa, Hisayuki Shimizu, Akikazu Tanimoto: Exposure apparatus for production of integrated circuit. Nippon Kogaku, Shapiro and Shapiro, August 14, 1984: US04465368 (258 worldwide citation)

An exposure apparatus for production of ICs of the type that includes a stage on which is placed a semiconductor wafer to be exposed by illumination light projecting means, and means for two-dimensionally moving the stage within a plane intersecting the illumination light at substantially right angl ...


5
Hirukawa Shigeru, Magome Nobutaka, Tanaka Issey: Exposure system and device producing method. Nippon Kogaku, September 7, 2005: EP1571697-A1 (192 worldwide citation)

Liquid is supplied by a supply mechanism (72) to a space between a lens (42) and a wafer (W) via a supply nozzle(36) on one side of the lens (42), and the liquid is recovered by a recovery mechanism (74) via a recovery pipe (52) on the other side of the lens (42). When the supply and the recovery of ...


6
Kiyoshi Uchikawa, Tatsuo Niwa: Dispersed iridium based complementary electrochromic device. Nippon Kogaku, Shapiro and Shapiro, March 24, 1987: US04652090 (163 worldwide citation)

An electrochromic device including one electrode layer (A), a cathodically coloring electrochromic layer (B), an ionic conductive layer (C) if required, a reversibly oxidizable layer (D) and another electrode layer (E), at least one of the one electrode layer (A) and the other electrode layer (E) be ...


7
Kenji Toyoda, Takao Watanabe, Hideya Inoue, Atsumi Kasuya, Yutaka Ichihara, Akira Miyaji, Katsumi Mizunoe: Electronic camera. Nippon Kogaku, Fitzpatrick Cella Harper & Scinto, June 26, 1984: US04456931 (154 worldwide citation)

Electronic camera comprises an image taking unit and a memory unit connected detachably. The image taking unit generates image signals corresponding to an object. The image signals are transmitted to the memory unit to be stored therein. The memory unit is detached from the image taking unit and con ...


8
Masato Shibuya, Makoto Uehara: Illumination optical arrangement. Nippon Kogaku, Shapiro and Shapiro, October 28, 1986: US04619508 (151 worldwide citation)

An illumination optical arrangement comprises light source means emitting a coherent light beam, and means for forming a substantially incoherent light source from the coherent light beam. The incoherent light source forming means includes means for periodically deflecting the coherent light beam an ...


9
Kenji Toyoda, Takao Watanabe, Hideya Inoue, Atsumi Kasuya, Yutaka Ichihara, Akira Miyaji: Electronic photographic camera. Nippon Kogaku, Fitzpatrick Cella Harper & Scinto, December 13, 1983: US04420773 (143 worldwide citation)

An electronic photographic camera includes an imaging optical system operable to be focused to an object to be photographed, a solid state imaging sensing device including a plurality of light-receiving elements disposed in the imaging plane of the imaging optical system and capable of producing a c ...


10
Kyoichi Suwa: Focusing apparatus for projection optical system. Nippon Kogaku, Shapiro and Shapiro, March 17, 1987: US04650983 (130 worldwide citation)

A focusing apparatus for projection optical system is provided with a projection optical system and an image-forming optical system. The projection optical system is disposed to project an image of an alignment mark formed on a photo mask or reticle onto a light-reflective substrate and also to reve ...