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Ishikawa Yuzuru, Nagasawa Sueki: Telecentric optical system and projection exposing device equipped with the same. Nikon Engineering, Nikon, April 26, 2002: JP2002-122781

PROBLEM TO BE SOLVED: To provide a compact telecentric optical system, etc., having a comparatively long operating distance, with high-specification.SOLUTION: The optical system is provided with negative, positive and positive lens groups G1, G2 and G3, in this order from an enlargement side, the gr ...


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Maruoka Yukio: Core centering device for optical fiber preform and manufacturing method for optical fiber. Nikon Engineering, Nikon, April 18, 2003: JP2003-112937

PROBLEM TO BE SOLVED: To provide a core centering device for optical fiber preform for forming a grinding reference hole coaxial with core before a grinding process of optical fiber preform.SOLUTION: The core centering device for optical fiber preform is provided with an illumination part 8 which is ...


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Kohno Hirotaka, Okuyama Takeshi, Nagasaka Hiroyuki, Nakano Katsushi: Exposure apparatus and method for manufacturing device. Nikon Corporation, Nikon Engineering, September 28, 2007: KR1020077004252

Disclosed is an exposure apparatus (EX) comprising a recovery port (22) for recovering a liquid (LQ), a blow port (32) arranged on the outer side of the recovery port (22) with respect to an optical path space (K1) for blowing a gas therethrough, and an exhaust vent (42) arranged between the recover ...


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Nagasaka Hiroyuki, Okuyama Takeshi: Exposure equipment, exposure method and device manufacturing method. Nikon Corporation, Nikon Engineering, March 22, 2007: KR1020067022688

Exposure equipment (EX) exposes a board (P) by irradiating the board (P) with exposure light (EL) through a projection optical system (PL) and a liquid (LQ). The exposure equipment (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). Th ...


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EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE. Nikon Engineering, Nikon Corporation, November 7, 2013: US20130293860-A1

Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an incline ...


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Nagasaka Hiroyuki, Okuyama Takeshi: Exposure apparatus, exposure method, and method for producing device. Nippon Kogaku, Nikon Engineering, yang dunbei, October 17, 2012: CN201210184248

Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ) ...


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EXPOSURE APPARATUS AND METHOD FOR PRODUCING DEVICE. NIKON CORPORATION, NIKON ENGINEERING, October 16, 2014: US20140307238-A1

A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes a projection system, a first nozzle member having an aperture through which the exposure beam is projected, the first ...