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Hiroyuki Nagasaka, Takeshi Okuyama: Exposure Apparatus, Exposure Method, and Method for Producing Device. Nikon Corporation, Nikon Engineering, Oliff & Berridge, October 30, 2008: US20080266533-A1

Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an incline ...


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Hirotaka Kohno, Takeshi Okuyama, Hiroyuki Nagasaka, Katsushi Nakano: Exposure apparatus and method for producing device. Nikon Corporation, Nikon Engineering, Oliff & Berridge, November 1, 2007: US20070252964-A1

A lithographic projection apparatus projects a pattern from a patterning device onto a substrate using a projection system. The apparatus has a liquid supply system to supply a liquid to a space between the projection system and the substrate. The apparatus also has a fluid removal system including ...


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Hiroyuki Nagasaka, Takeshi Okuyama: Exposure apparatus, exposure method, and method for producing device. Nikon Corporation, Nikon Engineering, Oliff & Berridge, September 27, 2007: US20070222957-A1

A lithographic projection projects a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate. The space is smaller in plan than the substrate. The apparatus includes a plate substantially parallel to the substrate to divide the space into two par ...


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Hiroyuki Nagasaka, Takeshi Okuyama: Exposure apparatus and device manufacturing method. Nikon Corporation, Nikon Engineering, Oliff & Berridge, August 10, 2006: US20060176456-A1

An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes: a liquid supply mechanism that has ...


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Hiroyuki Nagasaka, Takeshi Okuyama: Exposure apparatus, exposure method, and method for producing device. Nikon Corporation, Nikon Engineering, Oliff & Berridge, August 5, 2010: US20100195067-A1

A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate. The apparatus includes a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the ...


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Hiroyuki Nagasaka, Takeshi Okuyama: Exposure apparatus and device manufacturing method. Nikon Corporation, Nikon Engineering, Oliff & Berridge, June 18, 2009: US20090153820-A1

An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes a projection optical system having a ...


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Hiroyuki NAGASAKA, Takeshi Okuyama: Exposure apparatus and device manufacturing method. Nikon Engineering, Nikon Corporation, August 9, 2012: US20120200836-A1

An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes a projection optical system having a ...


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Hirotaka Kohno, Takeshi Okuyama, Hiroyuki Nagasaka, Katsushi Nakano: Exposure apparatus and method for producing device. Nikon Corporation, Nikon Engineering, Oliff & Berridge, October 22, 2009: US20090262316-A1

An exposure apparatus EX includes a recovery port which recovers a liquid, a blow port which is provided outside the recovery port with respect to an optical path space and which blows a gas therefrom, and a gas discharge port which is provided between the recovery port and blow port and which disch ...


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Mizoroke Shigeo: Exposure device. Nikon Engineering, September 25, 2008: JP2008-225287

PROBLEM TO BE SOLVED: To provide an exposure device improved in exposure illuminance.SOLUTION: The exposure device is set so that a request value for position precision of a mask pattern in an X direction perpendicular to a Y direction may be smaller than a request value for position precision of th ...


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Mizoroke Shigeo: Exposure device. Nikon Engineering, September 25, 2008: JP2008-225288

PROBLEM TO BE SOLVED: To provide an exposure device improved in productivity without requiring large labor.SOLUTION: The exposure device 1 exposes a plurality of louvers 10 held in the same plane by a fixture 18, and comprises two reticles 3a and 3b where predetermined mask patterns to be transferre ...