21
Tamura Yuichi: Confocal microscope. Nikon Engineering, Nikon, August 5, 2004: JP2004-219537 (1 worldwide citation)

PROBLEM TO BE SOLVED: To provide a confocal microscope which is made smaller in size than an imaging microscope.SOLUTION: The confocal microscope is provided with: a light emitting means 21 wherein a plurality of light emitting pixels capable of emitting light are two-dimensionally arranged; a light ...


22
Hirotaka Kohno, Takeshi Okuyama, Hiroyuki Nagasaka, Katsushi Nakano: Exposure apparatus and method for producing device. NIKON CORPORATION, NIKON ENGINEERING, Oliff, August 29, 2017: US09746781

A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes a projection system, a first nozzle member having an aperture through which the exposure beam is projected, the first ...


23
Hiroyuki Nagasaka: Exposure apparatus and method for producing device. Nikon Corporation, Nikon Engineering, Oliff, April 8, 2014: US08692973

A lithographic projection apparatus projects a pattern from a patterning device onto a substrate using a projection system. The apparatus has a liquid supply system to supply a liquid to a space between the projection system and the substrate. The apparatus also has a fluid removal system including ...


24
Hiroyuki Nagasaka, Takeshi Okuyama: Exposure apparatus and device manufacturing method. NIKON CORPORATION, NIKON ENGINEERING, Oliff, November 22, 2016: US09500959

A liquid confinement member supplies liquid to and collects the liquid from a liquid immersion area formed adjacent to a final optical element of an immersion exposure apparatus, and includes a channel formation member that surrounds a portion of the final optical element of the immersion exposure a ...


25
Hiroyuki Nagasaka, Takeshi Okuyama: Exposure apparatus and device manufacturing method. NIKON CORPORATION, NIKON ENGINEERING, Oliff, May 22, 2018: US09977352

A device manufacturing method forms a liquid immersion area under a projection system via which an exposure light is projected, while supplying a liquid via a liquid supply inlet of a liquid retaining member and collecting the supplied liquid along with a gas via a liquid recovery outlet of the liqu ...


26
Hiroyuki Nagasaka, Takeshi Okuyama: Exposure apparatus, exposure method, and method for producing device. NIKON CORPORATION, NIKON ENGINEERING, Oliff, February 12, 2019: US10203614

Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an incline ...


27
Hiroyuki Nagasaka, Takeshi Okuyama: Exposure apparatus, exposure method, and method for producing device. Nikon Corporation, Nikon Engineering, Oliff, April 22, 2014: US08704999

A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate. The apparatus includes a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the ...


28
Hiroyuki Nagasaka, Takeshi Okuyama: Exposure apparatus, exposure method, and method for producing device. Nikon Corporation, Nikon Engineering, Oliff & Berridge, August 13, 2013: US08508713

A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.


29
Hiroyuki Nagasaka, Takeshi Okuyama: Exposure apparatus, exposure method, and method for producing device. Nikon Corporation, Nikon Engineering, Oliff & Berridge, July 9, 2013: US08482716

Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an incline ...


30
KOHNO HIROTAKA, OKUYAMA TAKESHI, NAGASAKA HIROYUKI, NAKANO KATSUSHI: Appareil dexposition et procédé de fabrication dun dispositif, Belichtungsvorrichtung und Verfahren zur Herstellung einer Vorrichtung, Exposure apparatus and method for manufacturing device. NIPPON KOGAKU, NIKON ENGINEERING, October 3, 2012: EP2506289-A2

An exposure apparatus EX includes a recovery port 22 which recovers a liquid LQ, a blow port 32 which is provided outside the recovery port 22 with respect to an optical path space K1 and which blows a gas therefrom, and a gas discharge port 42 which is provided between the recovery port 22 and blow ...