1
Nagasaka Hiroyuki, Okuyama Takeshi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nikon Engineering, Nagasaka Hiroyuki, Okuyama Takeshi, SHIGA Masatake, January 20, 2005: WO/2005/006415 (89 worldwide citation)

(EN) An exposure apparatus is disclosed wherein an exposure of a substrate is carried out by forming an immersion region on a part of the substrate and projecting a pattern image onto the substrate through a liquid which forms the immersion region and a projection optical system. The exposure appara ...


2
Nagasaka Hiroyuki, Okuyama Takeshi: Exposure apparatus, exposure method, and device manufacturing method. Nikon, Nikon Engineering, June 22, 2006: JP2006-165500 (29 worldwide citation)

PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of performing satisfactory exposure processing while maintaining a liquid immersion region in a desired state.SOLUTION: The exposure apparatus EX irradiates a board (P) with exposure light EL via a projection optical system PL and a liqu ...


3
Nagasaka Hiroyuki, Okuyama Takeshi: (Ja) 露光装置、露光方法及びデバイス製造方法, (En) Exposure equipment, exposure method and device manufacturing method. Nikon Corporation, Nikon Engineering, Nagasaka Hiroyuki, Okuyama Takeshi, KAWAKITA Kijuro, December 22, 2005: WO/2005/122221 (25 worldwide citation)

(EN) Exposure equipment (EX) exposes a board (P) by irradiating the board (P) with exposure light (EL) through a projection optical system (PL) and a liquid (LQ). The exposure equipment (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ ...


4
Kazutoshi Motosugi: Optical three-dimensional shape measuring apparatus having a device for accurately positioning and measuring an object. Nikon Corporation, Nikon Engineering, August 20, 1996: US05548405 (9 worldwide citation)

An apparatus for measuring a three-dimensional shape of an object to be measured provided with a fitting portion, comprises: a body base; a rotation stage set on the base; an XY stage set on the rotation stage and provided with a fitting portion, the XY stage being movable in a predetermined horizon ...


5
Nagasaka Hiroyuki, Okuyama Takeshi: Exposure equipment, exposure method and device manufacturing method. Nippon Kogaku, Nikon Engineering, March 28, 2007: EP1768170-A1 (9 worldwide citation)

Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ) ...


6
Hiroyuki Nagasaka, Takeshi Okuyama: Exposure apparatus, exposure method, and method for producing device. Nikon Corporation, Nikon Engineering, Oliff, May 6, 2014: US08717533 (8 worldwide citation)

A lithographic projection projects a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate. The space is smaller in plan than the substrate. The apparatus includes a plate substantially parallel to the substrate to divide the space into two par ...


7
Yamazaki Hidekazu: Vertical illumination type microscope, inspection apparatus for probe card and method for manufacturing probe card. Nikon Engineering, Nikon, August 24, 2001: JP2001-228404 (8 worldwide citation)

PROBLEM TO BE SOLVED: To provide a vertical illumination type microscope which allows the distinct observation of the appearance of a cylindrical object to be inspected.SOLUTION: This microscope has a stage 101 for supporting the object 102a to be inspected, an objective lens 112 and a deflecting me ...


8
Uchiyama Kunio, Takahashi Yosuke, Uda Yutaka, Hoshino Susumu, Yamamoto Eiichi: Polishing device. Nikon Engineering, Nikon, July 16, 2002: JP2002-200553 (7 worldwide citation)

PROBLEM TO BE SOLVED: To prevent the contact pressure in a contact part between the surface of a substrate and a polishing face from becoming excessive even if the polishing face is protruded from the external edge of the substrate or the surface of the substrate is protruded from the external edge ...


9
Nagasaka Hiroyuki, Okuyama Takeshi: Exposure apparatus and method for manufacturing device. Nippon Kogaku, Nikon Engineering, April 12, 2006: EP1646075-A1 (6 worldwide citation)

An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes: a liquid supply mechanism that has ...


10
Kohno Hirotaka, Okuyama Takeshi, Nagasaka Hiroyuki, Nakano Katsushi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nikon Engineering, Kohno Hirotaka, Okuyama Takeshi, Nagasaka Hiroyuki, Nakano Katsushi, KAWAKITA Kijuro, August 3, 2006: WO/2006/080516 (6 worldwide citation)

(EN) Disclosed is an exposure apparatus (EX) comprising a recovery port (22) for recovering a liquid (LQ), a blow port (32) arranged on the outer side of the recovery port (22) with respect to an optical path space (K1) for blowing a gas therethrough, and an exhaust vent (42) arranged between the re ...