1
Omura Yasuhiro, Ikezawa Hironori, Williamson David M: Projection optical system and method for photolithography and exposure apparatus and method using same. Nikon Corporation, Omura Yasuhiro, Ikezawa Hironori, Williamson David M, HASEGAWA Yoshiki, March 4, 2004: WO/2004/019128 (891 worldwide citation)

Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path befo ...


2
Hirukawa Shigeru, Magome Nobutaka, Tanaka Issey: (Ja) 露光装置及びデバイス製造方法, (En) Exposure system and device producing method. Nikon Corporation, Hirukawa Shigeru, Magome Nobutaka, Tanaka Issey, TATEISHI Atsuji, June 24, 2004: WO/2004/053955 (703 worldwide citation)

(EN) Liquid is supplied by a supply mechanism (72) to between a lens (42) and a wafer (W) on a stage via a supply port (36) on one side of the lens (42), and the liquid is recovered by the recovering mechanism (74) via a recovery tube (52) on the other side of the lens (42). When the supply and the ...


3
Binnard Michael: Maintaining immersion fluid under a lithographic projection lens. Nikon Corporation, Binnard Michael, ROEDER Steven G, October 21, 2004: WO/2004/090577 (589 worldwide citation)

An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed. The apparatus and method includes an optical assembly (16) configured to project an image onto a work piece ...


4
Poon Alex Ka Tim, Kho Leonard Wai Fung: Apparatus and method for providing fluid for immersion lithography. Nikon Corporation, Poon Alex Ka Tim, Kho Leonard Wai Fung, COSTANTINO Mario A, March 17, 2005: WO/2005/024517 (577 worldwide citation)

Embodiments of the present invention are directed to a system and a method of controlling the fluid flow and pressure to provide stable conditions for immersion lithography. A fluid is provided in a space (34) between the lens (22) and the substrate (16) during the immersion lithography process. Flu ...


5
Hazelton Andrew J, Sogard Michael: Environmental system including vaccum scavange for an immersion lithography apparatus. Nikon Corporation, Hazelton Andrew J, Sogard Michael, COSTANTINO Mario A, October 21, 2004: WO/2004/090634 (573 worldwide citation)

An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254) and an immersion fluid system (252). The fluid barrier (254) is positioned near the device (30). The immersion fluid system (252) delivers an i ...


6
Novak Thomas W, Hazelton Andrew J, Watson Douglas C: Environmental system including a transport region for an immersion lithography apparatus. Nikon Corporation, Novak Thomas W, Hazelton Andrew J, Watson Douglas C, COSTANTINO Mario A, October 28, 2004: WO/2004/092833 (572 worldwide citation)

An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), and a transport region (256). The fluid barrier (254) is positioned near the device (30) and maintains the tr ...


7
Hazelton Andrew J, Kawai Hidemi, Watson Douglas C, Novak W Thomas: Cleanup method for optics in immersion lithography. Nikon Corporation, Hazelton Andrew J, Kawai Hidemi, Watson Douglas C, Novak W Thomas, COSTANTINO Mario A, October 28, 2004: WO/2004/093130 (561 worldwide citation)

An immersion lithography apparatus has a reticle stage (RST) arranged to retain a reticle (R), a working stage (9) arranged to retain a workpiece (W), and an optical system including an illumination source (1) and an optical element (PL) opposite the workpiece for having an image pattern of the reti ...


8
Novak W Thomas, Hazelton Andrew J, Watson Douglas C: Liquid jet and recovery system for immersion lithography. Nikon Corporation, Novak W Thomas, Hazelton Andrew J, Watson Douglas C, OLIFF PO BOX 19928 ALEXANDRIA VIRGINIA 22320 UNITED STATES OF AMERICA, October 28, 2004: WO/2004/092830 (557 worldwide citation)

A liquid jet and recovery system for an immersion lithography apparatus (100) has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected on a workpiece (W) such as a wafer. These nozzles are each adapted to serve selective ...


9
Novak Thomas W: Run-off path to collect liquid for an immersion lithography apparatus. Nikon Corporation, Novak Thomas W, COSTANTINO Mario A, October 28, 2004: WO/2004/093160 (552 worldwide citation)

An exposure apparatus (10) for transferring an image to a device (30) includes an optical assembly (16), an immersion fluid system (252), and a device stage assembly (20). The optical assembly (16) is positioned a gap (246) above the device (30). The immersion fluid system (252) fills the gap (246) ...


10
Coon Derek, Hazelton Andrew J: Immersion lithography fluid control system. Nikon Corporation, Coon Derek, Hazelton Andrew J, COSTANTINO Mario A, October 28, 2004: WO/2004/093159 (541 worldwide citation)

A fluid control system for immersion lithography is formed with an optical member (4) such as a lens, a workpiece (W) such as a semiconductor wafer with a surface disposed opposite to the optical member with a gap in between, a fluid-supplying device (21) for providing an immersion fluid (7) such as ...