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Nagasaka Hiroyuki, Magome Nobutaka: (Ja) 露光装置及び露光方法、デバイス製造方法, (En) Exposure apparatus, exposure method and method for manufacturing device. Nikon Corporation, Nagasaka Hiroyuki, Magome Nobutaka, KAWAKITA Kijuro, June 24, 2004: WO/2004/053956 (485 worldwide citation)

(EN) In an exposure apparatus, an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system (PL) and the substrate (P) with a liquid (50) and projecting the image of a pattern onto the substrate (P) through the projection optical system ...


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Nagasaka Hiroyuki, Owa Soichi, Nishii Yasufumi: (Ja) 露光装置、露光方法及びデバイス製造方法, (En) Exposure apparatus and method, and method of producing apparatus. Nikon Corporation, Nagasaka Hiroyuki, Owa Soichi, Nishii Yasufumi, KAWAKITA Kijuro, October 7, 2004: WO/2004/086468 (208 worldwide citation)

(EN) An exposure apparatus (EX) exposes a substrate (P) by projecting an image of a predetermined pattern on the substrate through a liquid (1). The exposure apparatus has a projection optical system for the projection and a liquid-feeding mechanism (10) for feeding a liquid on to the substrate to f ...


3
Nagasaka Hiroyuki, Yamamoto Taro, Hirakawa Osamu: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and device producing method. Nikon Corporation, Tokyo Electron, Nagasaka Hiroyuki, Yamamoto Taro, Hirakawa Osamu, SHIGA Masatake, March 31, 2005: WO/2005/029559 (148 worldwide citation)

(EN) An exposure apparatus for exposing a substrate by projecting an image of a pattern onto a substrate through a projection optical system and a liquid. The exposure apparatus has a liquid supply mechanism and a liquid recovery mechanism. The liquid supply mechanism supplies a liquid onto a substr ...


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Nagasaka Hiroyuki: (Ja) 露光方法及び露光装置並びにデバイス製造方法, (En) Exposure method, exposure device, and device manufacturing method. Nikon Corporation, Nagasaka Hiroyuki, KAWAKITA Kijuro, December 2, 2004: WO/2004/105106 (127 worldwide citation)

(EN) When exposing a substrate by projecting a pattern image onto the substrate via a projection optical system (PL) and liquid (1), an exposure method includes a decision of an immersion condition performed to the substrate such as a liquid type according to a film member (SP) formed on the substra ...


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Nagasaka Hiroyuki, Okuyama Takeshi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nikon Engineering, Nagasaka Hiroyuki, Okuyama Takeshi, SHIGA Masatake, January 20, 2005: WO/2005/006415 (89 worldwide citation)

(EN) An exposure apparatus is disclosed wherein an exposure of a substrate is carried out by forming an immersion region on a part of the substrate and projecting a pattern image onto the substrate through a liquid which forms the immersion region and a projection optical system. The exposure appara ...


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Nagasaka Hiroyuki, Yamamoto Taro, Hirakawa Osamu: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and device producing method. Nikon Corporation, Tokyo Electron, Nagasaka Hiroyuki, Yamamoto Taro, Hirakawa Osamu, SHIGA Masatake, August 4, 2005: WO/2005/071717 (83 worldwide citation)

(EN) An exposure apparatus for exposing a substrate by irradiating exposure light onto the substrate through a projection optical system and a liquid. The exposure apparatus has a supply tube for supplying the liquid, a recovery tube for recovering the liquid, a connection tube for connecting the su ...


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Nagasaka Hiroyuki: (Ja) 露光装置、露光方法及びデバイス製造方法, (En) Exposure apparatus, exposure method, and device producing method. Nikon Corporation, Nagasaka Hiroyuki, KAWAKITA Kijuro, July 21, 2005: WO/2005/067013 (83 worldwide citation)

(EN) An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through a liquid (LQ) supplied from a liquid supply mechanism (10) and through a projection optical system (PL). The exposure apparatus (EX) has a pressure regulation mechanism (90) for re ...


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Nagasaka Hiroyuki, Kohno Hirotaka, Nishii Yasufumi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and device producing method. Nikon Corporation, Nagasaka Hiroyuki, Kohno Hirotaka, Nishii Yasufumi, SHIGA Masatake, November 3, 2005: WO/2005/104195 (77 worldwide citation)

(EN) An exposure apparatus where liquid supply operation and liquid recovery operation for forming a liquid immersion region are excellently performed to form the liquid immersion region in a desired condition, enabling high exposure accuracy and measurement accuracy to be achieved. An exposure appa ...


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Nagasaka Hiroyuki: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nagasaka Hiroyuki, KAWAKITA Kijuro, January 20, 2005: WO/2005/006418 (73 worldwide citation)

(EN) Disclosed is an exposure apparatus for projecting and exposing a pattern image on a substrate (P) via a liquid (1) in an immersion region formed on the substrate (P) and a projection optical system (PL). The exposure apparatus comprises a liquid supply mechanism which has a feed opening (13A, 1 ...