1
Caroll Allen: Method and device for immersion lithography. Micronic Laser Systems, Caroll Allen, NORDKVIST Johan, April 14, 2005: WO/2005/034174 (395 worldwide citation)

The present invention relates to an immersion lithographic system for patterning a workpiece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation. Said system comprising a source emitting electromagnetic radiation onto an object plane, a mask ada ...


2
Torbjorn Sandstrom: Pattern generator using EUV. Micronic Laser Systems, Birch Stewart Kolasch & Birch, February 3, 2004: US06687041 (239 worldwide citation)

The present invention relates to an apparatus for creating a pattern with extremely high resolution on a workpiece, such as a pattern on a semiconductor chip. The apparatus comprises a source for emitting electromagnetic radiation in the EUV wavelength range, a spatial modulator (SLM) having a multi ...


3
Torbjorn Sandstrom: Pattern generator. Micronic Laser Systems, Harness Dickey, June 8, 2004: US06747783 (236 worldwide citation)

An apparatus is provided for creating a pattern on a workpiece sensitive to radiation, such as a photomask, a display panel or a microoptical device. The apparatus includes a radiation source and a spatial modulator (SLM) having a multitude of modulating elements (pixels). It further includes an ele ...


4
Torbjorn Sandstrom: Pattern generator for avoiding stitching errors. Micronic Laser Systems, Birch Stewart Kolasch & Birch, September 4, 2001: US06285488 (130 worldwide citation)

The present invention relates to an apparatus for creating a pattern on a workpiece, such as a photomask, a semiconductor wafer, an electronic interconnect device, a printed circuit board, a display panel, a microoptical device or a printing plate, whereby a pattern with less visible edges is create ...


5
Thomas J Grebinski, Ulrike A Dauderstadt, Torbjörn Sandström, Ulric B Ljungblad, Christian Kunath, Eberhard Kurth: High energy, low energy density, radiation-resistant optics used with micro-electromechanical devices. Micronic Laser Systems, Ernest J Beffel Jr, Haynes Beffel & Wolfeld, May 10, 2005: US06891655 (112 worldwide citation)

The present invention includes methods and devices that improve the radiation-resistance of a movable micromechanical optical element. In particular, a radiation-resistant layer is added to a movable micro-mechanical optical element, suitable to reduce the surface and bulk material changes to the el ...


6
Torbjörn Sandström: Defective pixel compensation method. Micronic Laser Systems, Ernest J Beffel Jr, Haynes Beffel & Wolfeld, September 9, 2003: US06618185 (62 worldwide citation)

The present invention relates to a method for compensating the impact of at least one defective pixel with a known position in a spatial light modulator (SLM) when creating a pattern of the SLM on a work piece covered with a layer sensitive to electromagnetic radiation. A source for emitting electro ...


7
Torbjorn Sandstrom: Modulator design for pattern generator. Micronic Laser Systems, Birch Stewart Kolasch & Birch, January 7, 2003: US06504644 (61 worldwide citation)

An apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask, a display panel or a microoptical device. The apparatus includes a radiation source, a spatial modulator (SLM) having a multitude of modulating elements (pixels), a projection system, an electronic data p ...


8
Torbjorn Sandstrom, Peter Ekberg, Per Askebjer, Mats Ekberg, Anders Thuren: Method for error reduction in lithography. Micronic Laser Systems, Harness Dickey & Pierce, April 19, 2005: US06883158 (58 worldwide citation)

The present invention relates to a method and a system for predicting and correcting geometrical errors in lithography using masks, such as large-area photomasks or reticles, and exposure stations, such as wafer steppers or projection aligners, printing the pattern of said masks on a workpiece, such ...


9
Peter Dürr: Method to detect a defective element. Micronic Laser Systems, Ernest J Beffel Jr, Haynes Beffel & Wolfeld, June 13, 2006: US07061226 (44 worldwide citation)

The present invention relates to a method to detect at least one defective pixel in a spatial light modulator comprising numerous pixel elements. The spatial light modulator is imaged to a detector. A relayed image of a first chess-board pattern of pixels in said spatial light modulator is detected ...


10
Allen Carroll: Method and device for immersion lithography. Micronic Laser Systems, Ernest J Beffel Jr, Haynes Beffel & Wolfeld, May 6, 2008: US07369217 (42 worldwide citation)

The present invention relates to an immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation. Said system comprising a source emitting electromagnetic radiation onto an object plane, a mask, a ...