1
Miodrag Oljaca, Andrew Tije Hunt, Brian T Reese, George Neuman: Liquid atomization methods and devices. MicroCoating Technologies, Alfred H Muratori, Wayne E Nacker, August 5, 2003: US06601776 (135 worldwide citation)

The present invention involves controlled atomization of liquids for various applications such as part/droplet seeding for laser-based measurements of flow velocity, temperature, and concentration; flame and a plasma based elemental analysis; nano-powder production; spray drying for generation of sm ...


2
Andrew T Hunt: Materials and processes for providing fuel cells and active membranes. MicroCoating Technologies, Wayne E Nacker, Alfred H Muratori, Edward J Kelly, June 11, 2002: US06403245 (107 worldwide citation)

The materials and processes for forming fuel cell electrodes can include substrates of codeposited materials including an electrically conductive material, such as graphite, a polymer film, such as a proton-exchange membrane, and a catalytic material, such as platinum. The material may be applied to ...


3
Andrew T Hunt, Tzyy Jiuan Hwang, Helmut G Hornis, Wen Yi Lin: Formation of thin film capacitors. MicroCoating Technologies, March 27, 2001: US06207522 (79 worldwide citation)

Thin layer capacitors are formed from a first flexible metal layer, a dielectric layer between about 0.03 and about 2 microns deposited thereon, and a second flexible metal layer deposited on the dielectric layer. The first flexible metal layer may either be a metal foil, such as a copper, aluminum, ...


4
Andrew T Hunt, John S Flanagan, George A Neuman: Formation of this film capacitors. MicroCoating Technologies, Wayne E Nacker, Darryl P Frickey, August 7, 2001: US06270835 (61 worldwide citation)

Thin layer capacitors are formed from a first flexible metal layer, a dielectric layer between about 0.03 and about 2 microns deposited thereon, and a second flexible metal layer deposited on the dielectric layer. The first flexible metal layer may either be a metal foil, such as a copper, aluminum, ...


5
Andrew T Hunt, Wen Yi Lin, Tzyy Jiuan Hwang, Michelle Hendrick, Helmut G Hornis: Formation of thin film capacitors. MicroCoating Technologies, Wayne E Nacker, Alfred H Muratori, S Matthew Cairns, August 13, 2002: US06433993 (61 worldwide citation)

Thin layer capacitors are formed from a first flexible metal layer, a dielectric layer between about 0.03 and about 2 microns deposited thereon, and a second flexible metal layer deposited on the dielectric layer. The first flexible metal layer may either be a metal foil, such as a copper, aluminum, ...


6
Andrew T Hunt, Helmut G Hornis: Chemical vapor deposition and powder formation using thermal spray with near supercritical and supercritical fluid solutions. Microcoating Technologies, Foley Hoag & Eliot, December 7, 1999: US05997956 (58 worldwide citation)

A method for chemical vapor deposition using a very fine atomization or vaporization of a reagent containing liquid or liquid-like fluid near its supercritical temperature, where the resulting atomized or vaporized solution is entered into a flame or a plasma torch, and a powder is formed or a coati ...


7
Andrew T Hunt, Wen Yi Lin, Richard W Carpenter: Nanolaminated thin film circuitry materials. MicroCoating Technologies, Wayne E Nacker, Alfred H Muratori, Darryl P Frickey, April 3, 2001: US06212078 (56 worldwide citation)

Nanolaminates are formed by alternating deposition, e.g., by combustion chemical vapor deposition (CCVD), layers of resistive material and layers of dielectric material. Outer resistive material layers are patterned to form discrete patches of resistive material. Electrical pathways between opposed ...


8
Andrew T Hunt: Systems and methods for delivering atomized fluids. MicroCoating Technologies, Alfred H Muratori, Wayne E Nacker, May 21, 2002: US06390076 (22 worldwide citation)

A method for causing a very fine atomization or vaporization of a liquid or liquid-like fluid, where the resulting atomized or vaporized solution is entered into engine, instrument or area for the fluid to be in mixed. The ability of the near supercritical atomizer to produce very fine droplets of a ...


9
Andrew T Hunt, Wen Yi Lin, Shara S Shoup, Richard W Carpenter, Stephen E Bottomley, Tzyy Jiuan Hwang, Michelle Hendrick: Formation of thin film resistors. Microcoating Technologies, Wayne E Nacker, Alfred H Muratori, Darryl P Frickey, December 11, 2001: US06329899 (19 worldwide citation)

A method is provided for forming a patterned layer of resistive material in electrical contact with a layer of electrically conducting material. A three-layer structure is formed which comprises a metal conductive layer, an intermediate layer formed of material which is degradable by a chemical etch ...


10
Andrew T Hunt, Helmut G Hornis: Chemical vapor deposition and powder formation using thermal spray with near supercritical and supercritical fluid solutions. Microcoating Technologies, Edward J Foley Hoag & Eliot Kelly, October 17, 2000: US06132653 (15 worldwide citation)

A method for chemical vapor deposition using a very fine atomization or vaporization of a reagent containing liquid or liquid-like fluid near its supercritical temperature, where the resulting atomized or vaporized solution is entered into a flame or a plasma torch, and a powder is formed or a coati ...