1
Levinson Harry J: Method for monitoring and controlling imaging in immersion lithography systems. Advanced Micro Devices, Levinson Harry J, sCOLLOPY Daniel R, February 10, 2005: WO/2005/013008 (354 worldwide citation)

A method of monitoring an immersion lithography system (10) in which a wafer (12) can be immersed in a liquid immersion medium (24). The method detects an index of refraction of the immersion medium in a volume of the immersion medium through which an exposure pattern is configured to traverse and d ...


2
Pawloski Adam R, Ado Amr Y, Amblard Gilles R, Lafontaine Bruno M, Lalovic Ivan, Levinson Harry J, Schefske Jeffrey A, Tabery Cyrus E, Tsai Frank: Immersion medium bubble elimination in immersion lithography. Advanced Micro Devices, Pawloski Adam R, Ado Amr Y, Amblard Gilles R, Lafontaine Bruno M, Lalovic Ivan, Levinson Harry J, Schefske Jeffrey A, Tabery Cyrus E, Tsai Frank, sCOLLOPY Daniel R, March 10, 2005: WO/2005/022266 (352 worldwide citation)

A method of operating an immersion lithography system (26), including steps of immersing at least a portion of a wafer (12) to be exposed in an immersion medium (24), wherein the immersion medium comprises at least one bubble (28); directing an ultrasonic wave (36) through at least a portion of the ...


3
Levinson Harry J: Method and apparatus for monitoring and controlling imaging in immersion lithography systems. Advanced Micro Devices, Levinson Harry J, sCOLLOPY Daniel R, February 24, 2005: WO/2005/017625 (351 worldwide citation)

A method of monitoring an immersion lithography system (10) in which a wafer (12) can be immersed in a liquid immersion medium (22) for exposure by an exposure pattern. The method detects the presence of a foreign body in the immersion medium to thereby determine if the immersion medium in a state t ...


4
Levinson Harry J, Wood Obert Reeves: Method and system for detecting existence of an undesirable particle during semiconductor fabrication. Advanced Micro Devices, Levinson Harry J, Wood Obert Reeves, DRAKE Paul S, June 5, 2008: WO/2008/066885

One exemplary embodiment is a method (500) for detecting existence of an undesirable particle (122) between a planar lithographic object, such as a semiconductor wafer (102) or a lithographic mask (202), and a chuck ( 104) during semiconductor fabrication. The exemplary method in this embodiment inc ...



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