1
Pawloski Adam R, Ado Amr Y, Amblard Gilles R, Lafontaine Bruno M, Lalovic Ivan, Levinson Harry J, Schefske Jeffrey A, Tabery Cyrus E, Tsai Frank: Immersion medium bubble elimination in immersion lithography. Advanced Micro Devices, Pawloski Adam R, Ado Amr Y, Amblard Gilles R, Lafontaine Bruno M, Lalovic Ivan, Levinson Harry J, Schefske Jeffrey A, Tabery Cyrus E, Tsai Frank, sCOLLOPY Daniel R, March 10, 2005: WO/2005/022266 (344 worldwide citation)

A method of operating an immersion lithography system (26), including steps of immersing at least a portion of a wafer (12) to be exposed in an immersion medium (24), wherein the immersion medium comprises at least one bubble (28); directing an ultrasonic wave (36) through at least a portion of the ...


2
Lafontaine Bruno M, Kim Ryoung Han, Kye Yongwook: Diffractive optical element for euv lithography. Advanced Micro Devices, Lafontaine Bruno M, Kim Ryoung Han, Kye Yongwook, DRAKE Paul S, October 30, 2008: WO/2008/130594

According to one exemplary embodiment, an EUV (extreme ultraviolet) optical element (122,222) in a light path between an EUV light source (124) and a semiconductor wafer (140) includes a reflective film (266) having a number of bilayers (258a,258b). The reflective film includes a pattern (244), wher ...



Click the thumbnails below to visualize the patent trend.