1
Masakatsu Ikisawa, Masataka Yahagi: Method for producing a-IGZO oxide thin film. JX Nippon Mining & Metals Corporation, Drinker Biddle & Reath, April 3, 2012: US08148245 (32 worldwide citation)

There is provided a method for producing an a-IGZO oxide thin film by sputtering, which can control the carrier density of the film to a given value with high reproducibility. The method is an amorphous In—Ga—Zn—O based oxide thin film production method including: providing a sintered oxide material ...


2
Yuichiro Nakamura, Akira Hisano: Sputtering target with few surface defects, and surface processing method thereof. JX Nippon Mining & Metals Corporation, Howson & Howson, March 22, 2011: US07909949 (20 worldwide citation)

Provided is a surface processing method of a sputtering target, wherein a target surface in which intermetallic compounds, oxides, carbides, carbonitrides and other substances without ductility exist in a highly ductile matrix phase at a volume ratio of 1 to 50% is preliminarily subject to the prima ...


3
Yuichiro Nakamura, Akira Hisano: Co-Cr-Pt-B alloy sputtering target. JX Nippon Mining & Metals Corporation, Howson & Howson, April 19, 2011: US07927434 (20 worldwide citation)

Provided is a Co—Cr—Pt—B alloy sputtering target comprising an island-shaped rolled structure formed from a Co-rich phase based on the primary crystal formed upon casting, and a Co—Cr—Pt—B alloy sputtering target in which the island-shaped rolled structure has an average size of 200 μm or less. This ...


4
Yasuhiro Kawahashi, Kentaro Okamoto: Positive-electrode active material for lithium ion battery, positive electrode for lithium ion battery, and lithium ion battery. JX Nippon Mining & Metals Corporation, Nields Lemack & Frame, January 7, 2014: US08623551 (16 worldwide citation)

The present invention provides a positive electrode active material for a lithium ion battery having good battery performance can be provided. The positive electrode active material for a lithium ion battery is represented by; Compositional formula:LixNi1−yMyO2+α wherein M is one or more selected fr ...


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KAWAHASHIYASUHIRO: リチウムイオン電池用正極活物質、リチウムイオン電池用正極、及びリチウムイオン電池 (JA), Positive-electrode active material for lithium ion battery, positive electrode for lithium battery, and lithium ion battery (EN). JX NIPPON MINING & METALS CORPORATION, Axis Patent International, September 9, 2011: WO/2011/108720 (15 worldwide citation)

Disclosed is a positive-electrode active material for a lithium-ion battery, which has excellent battery characteristics. The positive-electrode active material is expressed by the composition formula LixNi1-yMyO2+α, wherein M is one or more kinds of elements selected from among a group composed of ...


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KAJIYA Yoshio, KAWAHASHI Yasuhiro, NAGASE Ryuichi: リチウムイオン電池用正極活物質及びその製造方法, MATÉRIAU ACTIF DÉLECTRODE POSITIVE POUR BATTERIE AU LITHIUM-ION ET SON PROCÉDÉ DE PRODUCTION, POSITIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM ION BATTERIES AND METHOD FOR PRODUCING SAME. JX Nippon Mining & Metals Corporation, KAJIYA Yoshio, KAWAHASHI Yasuhiro, NAGASE Ryuichi, AXIS Patent International, November 22, 2012: WO/2012/157143 (15 worldwide citation)

Provided is a low-cost high-quality positive electrode active material for lithium ion batteries, which is reduced in the firing time of a composite of a lithium metal salt. A method for producing a positive electrode active material for lithium ion batteries comprises: a step in which a lithium met ...


9
Ryuichi Nagase: Positive electrode for lithium ion battery, method for producing said positive electrode, and lithium ion battery. JX Nippon Mining & Metals Corporation, Nields Lemack & Frame, March 31, 2015: US08993160 (14 worldwide citation)

The present invention provides a positive electrode for lithium ion battery reducing a contact resistance of a battery and achieving an excellent output property. The positive electrode for lithium ion battery comprising a mixed layer comprising: metal forming a current collector, and positive elect ...


10
Shiro Tsukamoto: Sputtering target and method for finishing surface of such target. JX Nippon Mining & Metals Corporation, Howson & Howson, May 31, 2011: US07951275 (14 worldwide citation)

Provided is a hollow cathode sputtering target comprising an inner bottom face having a surface roughness of Ra≦1.0 μm, and preferably Ra≦0.5 μm. This hollow cathode sputtering target has superior sputter film evenness (uniformity), generates few arcing and particles, is capable of suppressing the p ...