1
Hazelton Andrew J, Sogard Michael: Environmental system including vaccum scavange for an immersion lithography apparatus. Nikon Corporation, Hazelton Andrew J, Sogard Michael, COSTANTINO Mario A, October 21, 2004: WO/2004/090634 (573 worldwide citation)

An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254) and an immersion fluid system (252). The fluid barrier (254) is positioned near the device (30). The immersion fluid system (252) delivers an i ...


2
Novak Thomas W, Hazelton Andrew J, Watson Douglas C: Environmental system including a transport region for an immersion lithography apparatus. Nikon Corporation, Novak Thomas W, Hazelton Andrew J, Watson Douglas C, COSTANTINO Mario A, October 28, 2004: WO/2004/092833 (572 worldwide citation)

An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), and a transport region (256). The fluid barrier (254) is positioned near the device (30) and maintains the tr ...


3
Hazelton Andrew J, Kawai Hidemi, Watson Douglas C, Novak W Thomas: Cleanup method for optics in immersion lithography. Nikon Corporation, Hazelton Andrew J, Kawai Hidemi, Watson Douglas C, Novak W Thomas, COSTANTINO Mario A, October 28, 2004: WO/2004/093130 (561 worldwide citation)

An immersion lithography apparatus has a reticle stage (RST) arranged to retain a reticle (R), a working stage (9) arranged to retain a workpiece (W), and an optical system including an illumination source (1) and an optical element (PL) opposite the workpiece for having an image pattern of the reti ...


4
Novak W Thomas, Hazelton Andrew J, Watson Douglas C: Liquid jet and recovery system for immersion lithography. Nikon Corporation, Novak W Thomas, Hazelton Andrew J, Watson Douglas C, OLIFF PO BOX 19928 ALEXANDRIA VIRGINIA 22320 UNITED STATES OF AMERICA, October 28, 2004: WO/2004/092830 (557 worldwide citation)

A liquid jet and recovery system for an immersion lithography apparatus (100) has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected on a workpiece (W) such as a wafer. These nozzles are each adapted to serve selective ...


5
Coon Derek, Hazelton Andrew J: Immersion lithography fluid control system. Nikon Corporation, Coon Derek, Hazelton Andrew J, COSTANTINO Mario A, October 28, 2004: WO/2004/093159 (541 worldwide citation)

A fluid control system for immersion lithography is formed with an optical member (4) such as a lens, a workpiece (W) such as a semiconductor wafer with a surface disposed opposite to the optical member with a gap in between, a fluid-supplying device (21) for providing an immersion fluid (7) such as ...


6
Hazelton Andrew J, Takaiwa Hiroaki: Wafer table for immersion lithography. Nikon Corporation, Hazelton Andrew J, Takaiwa Hiroaki, COSTANTINO Mario A, February 3, 2005: WO/2005/010611 (268 worldwide citation)

Methods and apparatus for allowing a liquid to be substantially contained between a lens (46) and a wafer table (51) assembly of an immersion lithography system are disclosed. According to one aspect of the present invention, an exposure apparatus includes a lens (46) and a wafer table (51) assembly ...


7
Binnard Michael B, Hazelton Andrew J, Watson Douglas C, Arai Yoichi: Fine stage z support apparatus. Nikon Corporation, Binnard Michael B, Hazelton Andrew J, Watson Douglas C, Arai Yoichi, GARRETT Arthur S, May 18, 2006: WO/2006/052855 (2 worldwide citation)

An apparatus for supporting an object is disclosed. The apparatus includes an air bearing coupled to an air bellows. When used in a vacuum environment, the apparatus preferably includes an air bearing housing with vacuum to remove the pressurized fluid used in the air bearing.


8
Hazelton Andrew J: Heat pipe with temperature control. Nikon Corporation, Hazelton Andrew J, SU Peggy A, December 16, 2004: WO/2004/109757 (1 worldwide citation)

Methods and apparatus for controlling the boiling temperature of a fluid within a heat pipe (404) are disclosed. According to one aspect of the present invention, a method for controlling a temperature associated with a heat pipe that contains a fluid and has an evaporator end (606) includes measuri ...


9
Hazelton Andrew J, Tanaka Keiichi, Eaton John K: Exposure device having a planar motor. Nippon Kogaku, Hazelton Andrew J, January 3, 2001: EP1064713-A2

Disclosed is a planar motor device capable of effectively restraining thermal influence on the environment. When an electric current is supplied to armature coils (38) opposed to the magnet of a movable member (51), the movable member (51) is driven along a movement surface (21a) by electromagnetic ...


10
Hazelton Andrew J, Ebihara Akimitsu, Novak W Thomas: Wafer stage with magnetic bearings. Hazelton Andrew J, Nikon Corporation, Ebihara Akimitsu, Novak W Thomas, HILL David, November 1, 2001: WO/2001/081171

A high accuracy stage (1) supported in six degrees of freedom by electromagnetic bearings. Movements in the horizontal plane of the stage are supported by variable reluctance actuators which are mounted between the high accuracy stage (1) and a coarse stage (18) so as not to distort the high accurac ...