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Albert Barry Leese, Graham Williams, Lesley Margaret Smith, Simon Andrew Rushworth, Phillip Reeve Jacobs, Elizabeth Ann McKinnell, David Joseph Houlton: Process and apparatus for production of organometallic compounds. Epichem, Thompson Coburn, December 17, 2002: US06495707 (27 worldwide citation)

A process and apparatus for the continuous production of organometallic compounds from a metal precursor and an alkylating agent. The reactants are delivered separately to a reaction centre (


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Megan Ravetz, Graham Williams, Andrew Nelson, Roy Trevor Blunt, Howard Williams, Rajesh Odedra: Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites. Epichem, IQE, March 2, 2004: US06698728 (19 worldwide citation)

A method and apparatus for the bulk delivery of a precursor, such as an organometallic compound, from a bulk container, such as a bubbler (


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Williams Graham, Odedra Rajesh, Ravetz Megan, Nelson Andrew, Blunt Roy Trevor, Williams Howard: An apparatus for the delivery of precursors in the vapour phase to epitaxial reactor sites. Epichem, Iqe, July 23, 2003: EP1329540-A2 (5 worldwide citation)

An improved apparatus for the delivery of precursors in the vapour phase to epitaxial reactor sites. An apparatus for the delivery of a precursor, such as an organometallic compound, from a bulk container, such as a bubbler (1) to a plurality of reactor sites (12, 14, 16, 18, 20) wherein a carrier g ...


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Graham Williams, Raj Odedra, Hugh Cunning, Lindsay Smith: Method and apparatus for monitoring liquid levels within a vessel. Epichem, Thompson Coburn, September 5, 2006: US07100441 (4 worldwide citation)

An apparatus for monitoring the level of a liquid in a vessel comprises at least one metallic probe hermetically sealed within the vessel, the probe having a sealing end and at least a portion of the probe constituting a first electrode, the sealing end of the probe being encased within a glass mate ...


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Heys Peter, Williams Paul, Song Fuquan: Hafnocene and zirconocene cvd precursors. Epichem, May 23, 2007: GB2432363-A (4 worldwide citation)

A precursor suitable for chemical vapour deposition, especially ALD, of hafnium oxide or zirconium oxide has the formula: (RCp)2MR wherein Cp is a cyclopentadienyl ring; R,is H, alkyl, alkoxy, amide; R is alkyl, alkoxy, amide; M is hafnium or zirconium. In another aspect, a precursor has the formula ...


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Odedra Rajesh, Ravetz Megan Sarah, Jacobs Philiip Reeve, Williams Graham: Process and use of an apparatus for the isolation of pure, or substantially pure, organometallic compounds. Epichem, April 23, 2003: EP1303336-A1 (4 worldwide citation)

A process and apparatus to enable the continuous isolation of an organometallic compound, such as trimethylindium form a liquid feedstock. The liquid feedstock is delivered to a distillation column (2) having two heating zones (6, 8) to effect dissociation of the feedstock thereby liberating the org ...


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Jones Anthony Copeland: Improved precursors for chemical vapour deposition. Epichem, Jones Anthony Copeland, ROYSTONS, May 1, 2003: WO/2003/035926 (3 worldwide citation)

Ti, Zr Hf and La precursors for use in MOCVD techniques have a ligand of the general formula OCR?1¿(R?2¿)CH¿2?X, wherein R?1¿ is H or an alkyl group, R?2¿ is an optionally substituted alkyl group and X is selected from OR and NR¿2?, wherein R is an alkyl group or a substituted alkyl group.


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Anthony C Jones: Chemical vapor deposition of tin oxide films. Epichem, Seidel Gonda Lavorgna & Monaco PC, November 3, 1998: US05830530 (2 worldwide citation)

A method of depositing a tin oxide film onto a heated substrate is provided, by chemical vapor deposition using a tetraalkyoxy tin compound. Further provided is a method for doping the film with platinum or palladium using a .beta.-diketonate precursor thereof.


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Williams Graham, Odedra Rajesh, Cunning Hugh, Smith Lindsay: Monitoring liquid levels within a vessel. Epichem, January 21, 2004: GB2390905-A (2 worldwide citation)

An apparatus and method for monitoring liquid levels in a vessel (2) comprises a metallic probe (10) hermetically sealed within the vessel and forming a first electrode, a second electrode spaced apart from the first and forming a capacitor therewith, means for applying electric current to the capac ...