1
Chris Christenson
Rick L Tabor, Patricio Jimenez Jr, Wayne R Wilkomm, Ralph D Priester Jr, Marty C Cornell, Chris P Christenson, Kimberly F Bennett, Peder E Danielsen, Jeffery D Zawisza: Run flat tire support and colorant therefor. Dow Global Technologies, August 24, 2004: US06779572 (4 worldwide citation)

The present invention provides a unitary run flat tire (RFT) reinforcement that is formed into a relatively rigid shape. The reinforcement is insertable into a mold for an RFT support and can maintain the needed structural rigidity for such insertion. Further, the invention provides an RFT support t ...


2
Garo Khanarian
Weijun Zhou, Binghe Gu, John W Lyons, Allen S Bulick, Garo Khanarian, Paul J Popa, John R Ell: Curable liquid composite light emitting diode encapsulant. Rohm and Haas Electronic Materials, Dow Global Technologies, Thomas S Deibert, June 4, 2013: US08455607

A curable liquid polysiloxane/TiO2 composite for use as a light emitting diode encapsulant is provided, comprising: a polysiloxane with TiO2 domains having an average domain size of less than 5 nm, wherein the curable liquid polysiloxane/TiO2 composite contains 20 to 60 mol % TiO2 (based on total so ...


3
Garo Khanarian
John W Lyons, Binghe Gu, Allen S Bulick, Weijun Zhou, Paul J Popa, Garo Khanarian, John R Ell: Light emitting diode manufacturing method. Rohm and Haas Electronic Materials, Dow Global Technologies, Thomas S Deibert, May 28, 2013: US08450445

A method of making a light emitting diode (LED) having an optical element is provided, comprising: providing a curable liquid polysiloxane/TiO2 composite, which exhibits a refractive index of >1.61 to 1.7 and which is a liquid at room temperature and atmospheric pressure; providing a semiconductor l ...


4
Deodatta Shenai-Khatkhate
DIXIT RAVINDRA S, BAI HUA, MODTLAND CURTIS D, WARE ROBERT A, PENDERGAST JR JOHN G, CHRISTENSON CHRISTOPHER P, SHENAI KHATKHATE DEODATTA VINAYAK, AMAMCHYAN ARTASHES, CROUCH KENNETH M, POLCARI ROBERT F: [fr] Préparation de composés organométalliques, [de] Organometallische Verbindungszubereitung, [en] Organometallic compound preparation. ROHM & HAAS ELECT MATERIALS, Dow Global Technologies, February 20, 2013: EP2559682-A2

[en] A method of continuously manufacturing organometallic compounds is provided where two or more reactants are conveyed to a reactor having a laminar flow contacting zone, a heat transfer zone, and a mixing zone having a turbulence-promoting device. and causing the reactants to form the organometa ...


5
Jeffrey Calvert
Matthew L Grandbois, Harlan Robert Goltz, Jeffrey M Calvert, Matthew Lawrence Rodgers, Charles R Marston: Alpha-particle emitter removal. Dow Global Technologies, Rohm and Haas Electronic Materials, November 29, 2012: US20120298586-A1

Methods of purifying acidic metal solutions by removing at least a portion of alpha-particle emitting materials are provided. The purified metal solutions are useful in a variety of applications requiring low levels of alpha-particle emission.


6
Young Bae
Young Cheol BAE, Thomas Cardolaccia, Jibin Sun, Daniel J Arriola, Kevin A Frazier: Photoresist compositions and methods of forming photolithographic patterns. Dow Global Technologies, Rohm and Haas Electronic Materials, March 15, 2012: US20120064456-A1

Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The compositions, ...


7
Young Bae
Young Cheol BAE, Matthew M Meyer, Jibin Sun, Seung Hyun Lee, Jong Keun Park: Polymers, photoresist compositions and methods of forming photolithographic patterns. Dow Global Technologies, Rohm and Haas Electronic Materials, November 15, 2012: US20120288794-A1

Provided are polymers containing a unit having a particular acetal moiety and photoresist compositions containing such a polymer. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, photoresist compositions, methods a ...


8
Artie Chin
Nathan Tait Allen, Robert Butterick III, Arthur Achhing Chin, Dean Michael Millar, David Craig Molzahn: Process for production of a borohydride compound. Rohm and Haas Company, Dow Global Technologies, Kenneth Crimaldi, August 19, 2014: US08808662

A process for production of a borohydride compound M(BH4)y. The process has three steps. The first step combines a compound of formula (R1O)yM with aluminum, hydrogen and a metallic catalyst containing at least one metal selected from the group consisting of titanium, zirconium, hafnium, niobium, va ...


9
Artie Chin
Nathan Tait Allen, Robert Butterick III, Arthur Achhing Chin, Dean Michael Millar, David Craig Molzahn: Process for production of an aluminum hydride compound. Rohm and Haas Company, Dow Global Technologies, Kenneth Crimaldi, August 6, 2013: US08501137

A compound of formula M(AlH3OR1)y, wherein R1 is phenyl substituted by at least one of: (i) an alkoxy group having from one to six carbon atoms; and (ii) an alkyl group having from three to twelve carbon atoms; wherein M is an alkali metal, Be or Mg; and y is one or two.


10
Maricela Morales
Peter Trefonas, Phillip Dene Hustad, Cynthia Pierre: Underlayer composition and method of imaging underlayer. Dow Global Technologies, Rohm And Haas Electronic Materials, April 12, 2012: US20120088192-A1

A method of forming a pattern comprises diffusing an acid, generated by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer comprising an acid decomposable group and an attachment group, to form an interpolymer crosslink and/or covalently bonded ...