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Hensen Karl, Shen Kwo Hung, Chen Ruey Fang, Chu Jea Ju: Self-stabilizing cmp composition for metal layers. Basf Aktiengesellschaft, Hensen Karl, Shen Kwo Hung, Chen Ruey Fang, Chu Jea Ju, BASF Aktiengesellschaft, November 2, 2006: WO/2006/114416 (1 worldwide citation)

A slurry for use in chemical mechanical polishing of a metal layer comprising Fe-containing SiO2 metal oxide particles uniformly dispersed in a stable aqueous medium is provided. The Fe-containing SiO2 particles provide a mechanical polishing action during polishing. Additionally Fe-containing SiO2 ...


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Jeng Yu Lung, Chu Jea Ju, Lee Chang Tai, Hensen Karl: Slurry composition for color filter polishing. Basf Aktiengesellschaft, Jeng Yu Lung, Chu Jea Ju, Lee Chang Tai, Hensen Karl, December 21, 2006: WO/2006/134462 (1 worldwide citation)

The invention provides a slurry composition for polishing color filters. The slurry composition at least includes an abrasive, a buffer solution and an additive. The abrasive is selected from the group consisting of alumina, ceria, magnesia, silica, titania, zirconia, cupric oxide, ferric oxide, zin ...