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Binnard Michael: Maintaining immersion fluid under a lithographic projection lens. Nikon Corporation, Binnard Michael, ROEDER Steven G, October 21, 2004: WO/2004/090577 (589 worldwide citation)

An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed. The apparatus and method includes an optical assembly (16) configured to project an image onto a work piece ...


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Binnard Michael B, Hazelton Andrew J, Watson Douglas C, Arai Yoichi: Fine stage z support apparatus. Nikon Corporation, Binnard Michael B, Hazelton Andrew J, Watson Douglas C, Arai Yoichi, GARRETT Arthur S, May 18, 2006: WO/2006/052855 (2 worldwide citation)

An apparatus for supporting an object is disclosed. The apparatus includes an air bearing coupled to an air bellows. When used in a vacuum environment, the apparatus preferably includes an air bearing housing with vacuum to remove the pressurized fluid used in the air bearing.


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Totsu Masahiro, Binnard Michael B, Coakley Scott: Three degree of movement mover and method for controlling the same. Nikon Corporation, Totsu Masahiro, Binnard Michael B, Coakley Scott, ROEDER Steven G, October 30, 2008: WO/2008/130560 (2 worldwide citation)

A mover (344) moving a stage (238) along a first axis and about a second axis includes a magnetic component (454), and a conductor component (456). The magnetic component (454) includes one or more magnets (454D) that are surrounded by a magnetic field. The conductor component (456) is positioned ne ...


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BJORK Matthew Parker McCormick, BINNARD Michael B, COAKLEY Scott: AGENCEMENTS DE LIAISONS PARALLÈLES ET DE BOBINES DE MOTEUR DACTIONNEUR POUR SUPPORT DÉLÉMENTS TUBULAIRES, PARALLEL LINKAGE AND ACTUATOR MOTOR COIL DESIGNS FOR A TUBE CARRIER. NIKON CORPORATION, BJORK Matthew Parker McCormick, BINNARD Michael B, COAKLEY Scott, SU Peggy A, March 15, 2012: WO/2012/033933

A stage apparatus includes at least one tube having a first section and a second section, the first section being coupled to a point of reference. The apparatus also includes at least one magnet, a precision stage, and a tube carrier. The precision stage is positioned at least partially over the at ...


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PHARAND Michel, MAHADESWARASWAMY Chetan, BINNARD Michael B: [fr] SYSTÈME ET PROCÉDÉ DE GESTION DE TEMPÉRATURE DUN ENSEMBLE DE RÉACTION, [en] SYSTEM AND METHOD FOR CONTROLLING A TEMPERATURE OF A REACTION ASSEMBLY. PHARAND Michel, MAHADESWARASWAMY Chetan, BINNARD Michael B, NIKON CORPORATION, ROEDER Steven G, May 16, 2013: WO/2013/070568

[en] A stage assembly (10) that includes (i) a stage (14) that retains a device (26); (ii) a reaction assembly (18) that is spaced apart from the stage (14); (iii) a stage mover (16) that moves the stage (14), the stage mover (16) including a magnet array (38) that is coupled to the stage (14) and a ...


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YANG Pai Hsueh, COAKLEY Scott, BINNARD Michael B, HIRANO Kazuhiro, YUAN Bausan, Koo Shiang Lung: Détermination dun décalage de commutation et dune carte de compensation pour un étage, Determination of a commutation offset and a compensation map for a stage. Nikon Corporation, YANG Pai Hsueh, COAKLEY Scott, BINNARD Michael B, HIRANO Kazuhiro, YUAN Bausan, Koo Shiang Lung, SHIGA Masatake, November 24, 2011: WO/2011/145743

A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover assembly (220C) in a closed loop fashion to maintain the position of the stage (220A) along a first axis ...


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Binnard Michael B, Arai Youichi, Watson Douglas C, Phillips Alton H: Monolithic, non-contact six degree-of-freedom stage apparatus. Nikon Corporation, Binnard Michael B, Arai Youichi, Watson Douglas C, Phillips Alton H, SHIGA Masatake, November 27, 2008: WO/2008/143337

Methods and apparatus for controlling a stage assembly (110) in up to six degrees of freedom using actuators (115A-115C) which each allow for forces to be generated in a horizontal (130C) direction and a vertical direction (130A) are disclosed. According to one aspect of the present invention, a sta ...


10
Novak Thomas W, Binnard Michael B: Apparatus and method for exposing adjacent sites on a substrate. Nikon Corporation, Novak Thomas W, Binnard Michael B, Shiga Masatake, December 17, 2009: WO/2009/151154

An exposure apparatus (10) for transferring a mask pattern (352) from a mask (12) to a substrate (14) includes an illumination system (18), a mask stage assembly (22), a substrate stage assembly (24), and a control system (28). The substrate (14) includes a first site (1) and a second site (2) that ...