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Shyam Venkataraman
Raman Vijay Immanuel, Li Yuzhuo, Schade Christian, Venkataraman Shyam Sundar, Yu Shen Eason Su, Usman Ibrahim Sheik Ansar: [fr] COMPOSITION CHIMIQUE DE POLISSAGE MÉCANIQUE COMPRENANT DE LACIDE DE POLYVINYLE PHOSPHONIQUE ET SES DÉRIVÉS, [en] CHEMICAL MECHANICAL POLISHING COMPOSITION COMPRISING POLYVINYL PHOSPHONIC ACID AND ITS DERIVATIVES. Raman Vijay Immanuel, Li Yuzhuo, Schade Christian, Venkataraman Shyam Sundar, Yu Shen Eason Su, Usman Ibrahim Sheik Ansar, BASF SE, BASF, June 27, 2013: WO/2013/093557 (2 worldwide citation)

[en] A chemical mechanical polishing (CMP) composition comprising: (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one type of an organic polymeric compound as a dispersing agent or charge reversal agent comprising a phosphonate (P(=O)(OR1)(OR2) ) or phosp ...


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Shyam Venkataraman
KLIPP Andreas, RAMAN Vijay Immanuel, VENKATARAMAN Shyam Sundar, MELLIES Raimund, ZHONG Mingjie: COMPOSITION DE NETTOYAGE AQUEUSE SANS AZOTE, SA PRÉPARATION ET SON UTILISATION, AQUEOUS, NITROGEN-FREE CLEANING COMPOSITION, PREPARATION AND USE THEREOF. BASF SE, BASF, KLIPP Andreas, RAMAN Vijay Immanuel, VENKATARAMAN Shyam Sundar, MELLIES Raimund, ZHONG Mingjie, FITZNER Uwe, September 27, 2012: WO/2012/127336 (1 worldwide citation)

Aqueous, nitrogen-free cleaning composition, preparation and use thereof are provided. The composition having a pH of from 5 to 8 comprises (A) an amphiphilic nonionic, water-soluble or water-dispersible surfactant and (B) a metal chelating agent selected from polycarboxylic acids having at least 3 ...


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Shyam Venkataraman
Yuzhuo Li, Harvey Wayne Pinder, Shyam S Venkataraman: Chemical mechanical polishing (CMP) polishing solution with enhanced performance. BASF SE, Oblon Spivak McClelland Maier & Neustadt L, December 3, 2013: US08597539

This invention relates to a chemical composition for chemical mechanical polishing (CMP) of substrates that are widely used in the semiconductor industry. The inventive chemical composition contains additives that are capable of improving consistency of the polishing performance and extending the li ...


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