1
Erwin Meinders
De Laat Wilhelmus Johannes Maria, Gui Cheng Qun, Giesen Peter Theodorus Maria, Van Der Heijden Marcus Theodoor Wilhelmus, Meinders Erwin Rinaldo, Peter Maria: Lithographic apparatus and method. Asml Netherlands, Tno, de Laat Wilhelmus Johannes Maria, Gui Cheng Qun, Giesen Peter Theodorus Maria, Van Der Heijden Marcus Theodoor Wilhelmus, Meinders Erwin Rinaldo, Peter Maria, ROBERTS Peter David, May 14, 2009: WO/2009/060294 (1 worldwide citation)

A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including: directing a beam of radiation at the surface of the flexible substrate; and detecting changes in the intensity distribution of the beam of radiation after the beam of radiation ...


2
Erwin Meinders
Wilhelmus Johannes Maria De Laat, Cheng Qun Gui, Peter Theodorus Maria Giesen, Paulus Wilhelmus Leonardus Van Dijk, Erwin Rinaldo Meinders, Maria Peter: Lithographic method and carrier substrate. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 4, 2011: US08029973

A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic ...


3
Erwin Meinders
De Laat Wilhelmus Johannes Maria, Gui Cheng Qun, Giesen Peter Theodorus Maria, Leonardus Van Dijk Paulus Wilhelmus, Meinders Erwin Rinaldo, Peter Maria: Lithographic method and carrier substrate. Asml Netherlands, July 2, 2009: JP2009-147327

PROBLEM TO BE SOLVED: To provide a new lithographic carrier substrate.SOLUTION: A layer of PDMS and curing agent is provided on one side of the carrier substrate. The PDMS and curing agent receive and adhere to a lithographic substrate. Such dimensions can be given to the carrier substrate that the ...


4
Erwin Meinders
Wilhelmus Johannes Maria De Laat, Cheng Qun Gui, Peter Theodorus Maria Giesen, Marcus Theodoor Wilhelmus Van Der Heijden, Erwin Rinaldo Meinders, Mária Péter: Lithographic apparatus and method. Tno, ASML Netherlands, November 8, 2012: US20120281192-A1

A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after th ...


5
Erwin Meinders
Wilhelmus Johannes Maria DE LAAT, Cheng Qun GUI, Peter Theodorus Maria GIESEN, Paulus Wilhelmus Leonardus VAN DIJK, Erwin Rinaldo MEINDERS, Maria PETER: Lithographic method and carrier substrate. Asml Netherlands, Pillsbury Winthrop Shaw Pittman, July 2, 2009: US20090170025-A1

A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic ...


6
Van, Santen Helmar, Kolesnychenko Aleksey Yurievich: Lithographic apparatus and device manufacturing method. Asml Netherlands, Van, Santen Helmar, Kolesnychenko Aleksey Yurievich, LEEMING John Gerard, July 14, 2005: WO/2005/064405 (434 worldwide citation)

A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system (PL), a barrier member (10) and a substrate. The barrier member (10) is not sealed such that, during use, immersion liquid (5) is allowed to flow out the s ...


7
Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser: Imaging apparatus. ASML Netherlands, Pillsbury Winthrop, August 17, 2004: US06778257 (424 worldwide citation)

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub ...


8
Theodorus H J Bisschops, Jakob Vijfvinkel, Hermanus M J R Soemers, Johannes C Driessen, Michael J M Renkens, Adrianus G Bouwer: Gas bearings for use with vacuum chambers and their application in lithographic projection apparatuses. ASML Netherlands, Pillsbury Winthrop, August 5, 2003: US06603130 (413 worldwide citation)

A bearing for use in a vacuum chamber comprises a gas bearing discharging pressurised gas into a gap between two members to maintain a predetermined separation between those members. To avoid the gas forming the gas bearing being an unacceptable leak into the vacuum chamber, a vacuum pump is provide ...


9
Van Der, Net Antonius Johannes, Spiegelman Jeffrey, Van, Bragt Johannus Josephus: Lithographic projection apparatus, purge gas supply system and gas purging method. Asml Netherlands, Entegris, Van Der, Net Antonius Johannes, Spiegelman Jeffrey, Van, Bragt Johannus Josephus, WINCKELS J H F, January 27, 2005: WO/2005/008339 (392 worldwide citation)

A lithographic projection apparatus (1) comprising: a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired patter. The apparatus has a substrate table (WT) for holding a substrate, a projection system (PL) for projectin ...


10
Gellrich Bernhard, Wurmbrand Andreas, Kugler Jens, Schoeppach Armin, Zengerling Christian, Bruynooghe Stephane: Holding device for an optical element in an objective. Carl Zeiss Smt, Asml Netherlands, Gellrich Bernhard, Wurmbrand Andreas, Kugler Jens, Schoeppach Armin, Zengerling Christian, Bruynooghe Stephane, LORENZ Werner, June 16, 2005: WO/2005/054953 (392 worldwide citation)

A holding device (6) for an optical element (5) in an objective (1) has a mount (4) that is connected to the objective (1) , on the one hand, and at least indirectly to the optical element (5), on the other hand. Arranged between the mount (4) and the optical element (5) is a reinforcing element (8) ...