1
Pak Harvey Helen He Yon, Mao Chung Ling: Redispersible acrylic polymer powder for cementitious compositions.. Air Prod & Chem, June 15, 1994: EP0601518-A1 (52 worldwide citation)

A method for preparing an acrylic polymer powder which is redispersible in water by atomizing an aqueous polymer dispersion containing a dispersing aid, the improvement which comprises employing an acrylic polymer containing 1-15 wt% olefinically unsaturated carboxylic acid comonomer and an effectiv ...


2
Vichr Miroslav, Hoover David Samuel: Method for the manufacture of large single crystals.. Air Prod & Chem, December 15, 1993: EP0573943-A1 (44 worldwide citation)

A method is disclosed for producing large single crystals. In one embodiment, a single crystal of electronic grade diamond is produced having a thickness of approximately 100-1000 microns and an area of substantially greater than 1 cm.. and having a high crystalline perfection which can be used in e ...


3
Process for producing synthetic natural gas. Air Prod & Chem, October 20, 1976: GB1453081-A (43 worldwide citation)

1453081 Synthetic pipeline gas AIR PRODUCTS & CHEMICALS Inc 26 Sept 1973 [12 Oct 1972] 45129/73 Heading C5E Pipeline gas is produced by partially vaporizing a crude oil feed in the presence of hydrogen at 600-1000 F.; reacting the stream of hydrogen and vaporized oil to produce an effluent consistin ...


4
Vrtis Raymond Nicholas, O& 039, Neill Mark Leonard, Vincent Jean Louise, Lukas Aaron Scott, Xiao Manchao, Norman John Anthony Thomas: Method for forming a porous sioch layer.. Air Prod & Chem, October 22, 2003: EP1354980-A1 (41 worldwide citation)

A porous organosilica glass (OSG) film consists of a single phase of a material represented by the formula SivOwCxHyFz, where v+w+x+y+z = 100%, v is from 10 to 35 atomic%, w is from 10 to 65 atomic%, x is from 5 to 30 atomic%, y is from 10 to 50 atomic% and z is from 0 to 15 atomic%, wherein the fil ...


5
Hochberg Arthur Kenneth, O& 039, Meara David Lillis: Deposition of silicon oxide films using alkylsilane liquid sources.. Air Prod & Chem, September 19, 1990: EP0387403-A1 (38 worldwide citation)

A chemical vapor deposition process for depositing silicon dioxide comprising the steps of heating a substrate upon which deposition is desired to a temperature of from about 325 DEG C. to about 700 DEG C. in a vacuum having a pressure of from about 0.1 to about 1.5 torr, and introducing a silane se ...


6
Roberts David Allen, Ivankovits John Christopher, Bohling David Arthur: Cleaning agents used during the fabrication of integrated circuits and associated process.. Air Prod & Chem, April 14, 1993: EP0536752-A2 (36 worldwide citation)

This invention is a vapor-phase process for cleaning metal-containing contaminants from the surfaces of integrated circuits and semiconductors between the numerous fabricating steps required to manufacture the finished electronic devices. The process comprises contacting the surface to be cleaned wi ...


7
Vijayendran Bheema Rao, Derby Richard, Gruber Bruce Alan: Aqueous polyurethane-vinyl polymer dispersions for coating applications.. Air Prod & Chem, October 28, 1992: EP0510572-A2 (36 worldwide citation)

A method for making an aqueous polyurethane-vinyl polymer dispersion which comprises: (a) forming a carboxy-containing, water-dispersible, isocyanate terminated polyurethane prepolymer, (b) adding a vinyl monomer composition which includes a polyethylenically unsaturated monomer to the prepolymer to ...


8
Laxman Ravi K, Hochberg Arthur K: Low temperature deposition of silicon dioxide using organosilanes. Air Prod & Chem, July 10, 1996: EP0721019-A2 (35 worldwide citation)

The present invention is a process for very low temperature chemical vapor deposition of silicon dioxide, comprising the steps of a) heating a substrate upon which silicon dioxide is to be deposited to a temperature in the range of approximately 150 to 500 DEG C in a vacuum maintained at a pressure ...


9
Tien Chao Fong, Chen Ning, Mao Chung Ling: Water borne crosslinkable compositions. Air Prod & Chem, April 10, 1996: EP0705855-A2 (34 worldwide citation)

This invention relates to improved water-based polymeric dispersions having suitability for coatings and other applications which are based upon polymers having a plurality of acetoacetate functional groups and a crosslinkable component comprising a plurality of aromatic aldimine. The basic acetoace ...


10
Senzaki Yoshihide, Roberts David Allen, Norman John Anthony Thomas, Hochberg Arthur Kenneth: Liquid precursor mixtures for deposition of multicomponent metal containing materials. Air Prod & Chem, October 17, 2001: EP1146141-A2 (33 worldwide citation)

The present invention is a composition for deposition of a mixed metal or metal compound layer, comprising a solventless mixture of at least two metal-ligand complex precursors, wherein the mixture is liquid at ambient conditions and the ligands are the same and are selected from the group consistin ...