WO/2007/005362 is referenced by 13 patents.

Disclosed are immersion lithography methods and systems involving irradiating a photoresist through a lens and an immersion liquid of an immersion lithography tool, the immersion liquid in an immersion space contacting the lens and the photoresist; removing the immersion liquid from the immersion space; charging the immersion space with a supercritical fluid; removing the supercritical fluid from the immersion space; and charging the immersion space with immersion liquid.

Title
Use of supercritical fluid to dry wafer and clean lens in immersion lithography
Application Number
PCT/US2006/024765
Publication Number
2007/005362
Application Date
June 23, 2006
Publication Date
January 11, 2007
Inventor
Phan Khoi A
Singh Bhanwar
Subramanian Ramkumar
Agent
DRAKE Paul S
Assignee
Phan Khoi A
Singh Bhanwar
Subramanian Ramkumar
Spansion
Advanced Micro Devices
IPC
G03F 07/20
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