WO/2005/085956 is referenced by 2 patents.

Disclosed are a method and apparatus for preventing contamination in a lithographic apparatus (10) including a projection system (24). The lithographic apparatus (10) images an irradiated portion of a mask (22) onto a target portion (40) of a substrate (28). A pellicle (32, 36) is placed with respect to a surface (34, 38) of the projection system (24) to inhibit contamination of the surface (34, 38) using a moveable mounting means (42a, 42b).

Title
Pellicle for a lithographic lens
Application Number
PCT/US2005/006210
Publication Number
2005/085956
Application Date
February 26, 2005
Publication Date
September 15, 2005
Inventor
Lyons Christopher F
Babcock Carl P
Kye Jongwook
Agent
DRAKE Paul S
Assignee
Lyons Christopher F
Babcock Carl P
Kye Jongwook
Advanced Micro Devices
IPC
G03F 07/20
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