WO/2005/062128 is referenced by 345 patents.
A method of making a device using a lithographic system (10) having a lens (32) from which an exposure pattern (24) is emitted. A conforming immersion medium (26) can be positioned between a photo resist layer (34) and the lens. The photo resist layer, which can be disposed over a wafer, and the lens can be brought into intimate contact with the conforming medium. The photo resist can then be exposed with the exposure pattern so that the exposure pattern traverses the conforming immersion medium.