WO/2005/062128 is referenced by 345 patents.

A method of making a device using a lithographic system (10) having a lens (32) from which an exposure pattern (24) is emitted. A conforming immersion medium (26) can be positioned between a photo resist layer (34) and the lens. The photo resist layer, which can be disposed over a wafer, and the lens can be brought into intimate contact with the conforming medium. The photo resist can then be exposed with the exposure pattern so that the exposure pattern traverses the conforming immersion medium.

Title
Immersion lithographic process using a conforming immersion medium
Application Number
PCT/US2004/035419
Publication Number
2005/062128
Application Date
October 26, 2004
Publication Date
July 7, 2005
Inventor
Kye Jongwook
Babcock Carl P
Lyons Christopher F
Agent
DRAKE Paul S
Assignee
Kye Jongwook
Babcock Carl P
Lyons Christopher F
Advanced Micro Devices
IPC
G03F 07/20
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