WO/2005/059617 is referenced by 422 patents.

A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n ≥ 1.6 at the operating wavelength.

Title
Projection objective having a high aperture and a planar end surface
Application Number
PCT/EP2004/014062
Publication Number
2005/059617
Application Date
December 10, 2004
Publication Date
June 30, 2005
Inventor
Singer Wolfgang
Beder Susanne
Agent
PATENTANWÄLTE RUFF WILHELM BEIER DAUSTER Kronenstrasse 30 70174 Stuttgart
Assignee
Singer Wolfgang
Beder Susanne
Carl Zeiss Smt
IPC
G03F 07/20
G02B 17/00
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