WO/2005/024325 is referenced by 356 patents.

A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion fluid from the thin film is performed prior to baking the thin film, thereby reducing the likely hood for interaction of immersion fluid with the baking process. This interaction has been shown to cause non-uniformity in critical dimension for the pattern formed in the thin film following the developing process.

Title
Method and system for drying a substrate
Application Number
PCT/US2004/018925
Publication Number
2005/024325
Application Date
July 8, 2004
Publication Date
March 17, 2005
Inventor
Yamaguchi Richard
Yoshioka Kaz
Nafus Kathleen
Ho Chung Peng
Agent
MAIER Gregory J
Assignee
Yamaguchi Richard
Yoshioka Kaz
Nafus Kathleen
Ho Chung Peng
Tokyo Electron
IPC
G21K 05/10
G21K 05/08
G03F 07/38
G03C 05/00
G02B 21/00
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