WO/2005/019935 is referenced by 347 patents.

A system and/or method are disclosed for measuring (250) and/or controlling (260) refractive index (n) and/or lithographic constant (k) of an immersion medium (210) utilized in connection with immersion lithography. A known grating structure (602) is built upon a substrate (220). A refractive index monitoring component (340) facilitates measuring and/or controlling the immersion medium (210) by utilizing detected light scattered from the known grating structure (602).

Title
Refractive index system monitor and control for immersion lithography
Application Number
PCT/US2004/026716
Publication Number
2005/019935
Application Date
August 16, 2004
Publication Date
March 3, 2005
Inventor
Subramanian Ramkumar
Singh Bhanwar
Rangarajan Bharath
Phan Khoi A
Agent
COLLOPY Daniel R
Assignee
Subramanian Ramkumar
Singh Bhanwar
Rangarajan Bharath
Phan Khoi A
Advanced Micro Devices
IPC
G03F 07/20
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