WO/2005/017625 is referenced by 351 patents.

A method of monitoring an immersion lithography system (10) in which a wafer (12) can be immersed in a liquid immersion medium (22) for exposure by an exposure pattern. The method detects the presence of a foreign body in the immersion medium to thereby determine if the immersion medium in a state that is acceptable for exposing the wafer with the exposure pattern. Also disclosed is a monitoring and control system (26) for an immersion lithography system.

Title
Method and apparatus for monitoring and controlling imaging in immersion lithography systems
Application Number
PCT/US2004/023875
Publication Number
2005/017625
Application Date
July 23, 2004
Publication Date
February 24, 2005
Inventor
Levinson Harry J
Agent
sCOLLOPY Daniel R
Assignee
Levinson Harry J
Advanced Micro Devices
IPC
G03F 07/20
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