WO/2005/013008 is referenced by 354 patents.

A method of monitoring an immersion lithography system (10) in which a wafer (12) can be immersed in a liquid immersion medium (24). The method detects an index of refraction of the immersion medium in a volume of the immersion medium through which an exposure pattern is configured to traverse and determines if the index of refraction is acceptable for exposing the wafer with the exposure pattern. Also disclosed is a monitoring and control system (26) for an immersion lithography system (10).

Title
Method for monitoring and controlling imaging in immersion lithography systems
Application Number
PCT/US2004/023876
Publication Number
2005/013008
Application Date
July 23, 2004
Publication Date
February 10, 2005
Inventor
Levinson Harry J
Agent
sCOLLOPY Daniel R
Assignee
Levinson Harry J
Advanced Micro Devices
IPC
G03F 07/20
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