WO/2005/006415 is referenced by 89 patents.

(EN) An exposure apparatus is disclosed wherein an exposure of a substrate is carried out by forming an immersion region on a part of the substrate and projecting a pattern image onto the substrate through a liquid which forms the immersion region and a projection optical system. The exposure apparatus comprises a liquid supply mechanism having a feed opening arranged opposite to the surface of the substrate. A channel of the liquid supply mechanism is provided with a buffer space, and the liquid supply mechanism begins supply of the liquid to the feed opening after storing a certain amount of the liquid in the buffer space.(JA) この露光装置は、基板上の一部に液浸領域を形成し、該液浸領域を形成する液体と投影光学系とを介してパターンの像を基板上に投影することによって前記基板を露光する露光装置であって、前記基板表面に対向するように配置された供給口を有する液体供給機構を備え、前記液体供給機構の流路にはバッファ空間が形成されており、前記バッファ空間に所定量以上の液体を貯めてから前記供給口への液体供給が開始される。

(Ja) 露光装置及びデバイス製造方法
(En) Exposure apparatus and method for manufacturing device
Application Number
Publication Number
Application Date
July 8, 2004
Publication Date
January 20, 2005
Okuyama Takeshi
Nagasaka Hiroyuki
SHIGA Masatake
Okuyama Takeshi
Nagasaka Hiroyuki
Nikon Engineering
Nikon Corporation
G03F 07/20
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