WO/2004/090956 is referenced by 166 patents.

(EN) An exposure apparatus (EX) is disclosed wherein an image of a pattern is projected onto a substrate (P) via a projection optical system (PL) and the substrate (P) is exposed to light. The exposure apparatus (EX) comprises a movable substrate stage (PST) for holding the substrate (P) above the projection optical system (PL), and an immersion unit (100) for filling at least a portion of the space between the projection optical system (PL) and the substrate (P) with a liquid (30). In this exposure apparatus (EX), an image of a pattern is projected onto the substrate (P) through the projection optical system (PL) and the liquid (30). With this structure, the exposure apparatus enables to suppress scattering of the liquid used for forming the immersion region, and carries out an exposure process of the substrate with a desired pattern accuracy without having the piping for supply and collection of the liquid obstruct the movement of the substrate stage.(JA) 露光装置EXは、パターンの像を投影光学系PLを介して基板P上に投影し、この基板Pを露光するものであって、投影光学系PLの上方で基板Pを保持して移動可能な基板ステージPSTと、投影光学系PLと基板Pとの間の少なくとも一部を液体30で満たす液浸ユニット100とを備え、投影光学系PLと液体30とを介してパターンの像を基板P上に投影する。このようにすることで、液浸領域を形成するための液体の飛散を抑え、液体の供給、回収用の配管類で基板ステージの移動を妨げずに所望のパターン精度で基板を露光処理できる露光装置を提供することができる。

Title
(Ja) 露光装置及びデバイス製造方法
(En) Exposure apparatus and method for manufacturing device
Application Number
PCT/JP2004/004969
Publication Number
2004/090956
Application Date
April 6, 2004
Publication Date
October 21, 2004
Inventor
Hara Hideaki
Agent
SHIGA Masatake
Assignee
Hara Hideaki
Nikon Corporation
IPC
G03F 07/20
View Original Source