WO/2004/019128 is referenced by 891 patents.

Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path before light passes into the immersion liquid to impinge on the image plane.

Title
Projection optical system and method for photolithography and exposure apparatus and method using same
Application Number
PCT/JP2003/010665
Publication Number
2004/019128
Application Date
August 22, 2003
Publication Date
March 4, 2004
Inventor
Williamson David M
Ikezawa Hironori
Omura Yasuhiro
Agent
HASEGAWA Yoshiki
Assignee
Williamson David M
Ikezawa Hironori
Omura Yasuhiro
Nikon Corporation
IPC
G03F 07/20
G02B 17/08
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