3688655 is referenced by 8 patents and cites 2 patents.

A method of, and an apparatus for, writing mask patterns on a photographic material by means of light are described in which a spot of light is formed from light from a source of light by means of an opening which in principle is rectangular, the said light spot being swept over the photographic material in paths which correspond to the mask patterns to be written. It is shown that by separately controlling two boundaries which determine the length of the light spot in the direction of writing, for each infinitesimal element of a pattern element the time which elapses between the passage of the initial boundary of the light spot and the passage of the final boundary of the light spot over the infinitesimal element can be maintained constant.

Title
Method of, and apparatus for, writing mask patterns on photographic material by means of light
Application Number
05/081,276
Publication Number
3688655
Application Date
October 16, 1970
Publication Date
September 5, 1972
Inventor
NL
Adrianus Gerardus Bouwer Emmasingel
Eindhoven NL
Andreas Petrus Theodorus Hermanus Jentjens
NL
Frits Theodoor Klostermann Emmasingel
Agent
Frank R Trifari
Assignee
US Philips Corporation New York NY
IPC
G03b 29/00
G03F 07/20
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