3622319 is referenced by 168 patents and cites 6 patents.

A nonreflecting photomask comprises a pattern of an anodized, film-forming material on a transparent substrate. The thickness of the anodic oxide is chosen such that when the mask is employed in selectively exposing a photoresist-coated body to light (by placing the oxide against the photoresist), destructive interference prevents light reflected from the body to the oxide from being re-reflected to the photoresist. Thus, undesirable exposure of masked portions of the photoresist is precluded.

Nonreflecting photomasks and methods of making same
Application Number
Publication Number
Application Date
October 20, 1966
Publication Date
November 23, 1971
Sharp Donald Jex
Western Electric Company Incorporated
G03c 05/04
H01L 49/02
G03F 01/08
H01L 21/00
C25D 11/02
C23F 01/02
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