3622319 is referenced by 168 patents and cites 6 patents.

A nonreflecting photomask comprises a pattern of an anodized, film-forming material on a transparent substrate. The thickness of the anodic oxide is chosen such that when the mask is employed in selectively exposing a photoresist-coated body to light (by placing the oxide against the photoresist), destructive interference prevents light reflected from the body to the oxide from being re-reflected to the photoresist. Thus, undesirable exposure of masked portions of the photoresist is precluded.

Title
Nonreflecting photomasks and methods of making same
Application Number
04/593,610
Publication Number
3622319
Application Date
October 20, 1966
Publication Date
November 23, 1971
Inventor
Sharp Donald Jex
Assignee
Western Electric Company Incorporated
IPC
G03c 05/04
H01L 49/02
G03F 01/08
H01L 21/00
C25D 11/02
C23F 01/02
View Original Source