09915882 cites 53 patents.

An exposure apparatus that exposes a substrate by exposure light via liquid between an optical member and the substrate, the exposure apparatus includes: an apparatus frame, an optical system including the optical member, a liquid immersion member that is configured to form an immersion liquid space and that includes a first member disposed at at least a portion of surrounding of the optical member and a second member disposed at at least a portion of surrounding of the optical member, a driving apparatus configured to relatively move the second member with respect to the first member, and a vibration isolator by which the first member is supported to the apparatus frame.

Title
Exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
Application Number
14/681386
Publication Number
9915882 (B2)
Application Date
April 8, 2015
Publication Date
March 13, 2018
Inventor
Shinji Sato
Fukaya
JP
Agent
Oliff
Assignee
NIKON CORPORATION
JP
IPC
G03F 7/20
G03B 27/52
G03B 27/42
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