09773648 is referenced by 18 patents and cites 1605 patents.

Embodiments of the present technology may include a method of processing a semiconductor substrate. The method may include providing the semiconductor substrate in a processing region. Additionally, the method may include flowing gas through a cavity defined by a powered electrode. The method may further include applying a negative voltage to the powered electrode. Also, the method may include striking a hollow cathode discharge in the cavity to form hollow cathode discharge effluents from the gas. The hollow cathode discharge effluents may then be flowed to the processing region through a plurality of apertures defined by electrically grounded electrode. The method may then include reacting the hollow cathode discharge effluents with the semiconductor substrate in the processing region.

Title
Dual discharge modes operation for remote plasma
Application Number
14/468066
Publication Number
9773648 (B2)
Application Date
August 25, 2014
Publication Date
September 26, 2017
Inventor
Dmitry Lubomirsky
Cupertino
CA, US
Soonam Park
Sunnyvale
CA, US
Yi Heng Sen
San Jose
CA, US
Tae Seung Cho
San Jose
CA, US
Agent
Kilpatrick Townsend & Stockton
Assignee
Applied Materials
CA, US
IPC
H01J 37/32
C23C 14/32
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