09494870 is referenced by 1 patents and cites 46 patents.

An exposure apparatus exposes a substrate by exposure light via liquid between an emitting surface of an optical member and the substrate. The exposure apparatus includes: a liquid immersion member configured to form an immersion liquid space on an object and including a first and second member, the first being disposed at at least a portion of surrounding of the optical member, the second being disposed at at least a portion of surrounding of an optical path of the exposure light below the first member, being movable with respect to the first member and including a second upper and lower surface, the second upper surface being opposite a first lower surface of the first member via a gap, the second lower surface being capable of being opposite to the object, which is movable below the optical member; and a vibration isolator configured to suppress a vibration of the first member.

Title
Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
Application Number
14/47433
Publication Number
9494870 (B2)
Application Date
October 7, 2013
Publication Date
November 15, 2016
Inventor
Shinji Sato
Fukaya
JP
Agent
Oliff
Assignee
NIKON CORPORATION
JP
IPC
G03F 7/20
G03B 27/42
G03B 27/52
View Original Source