08896806 is referenced by 18 patents and cites 40 patents.

An exposure apparatus that exposes a substrate includes: an optical system that includes an emission surface from which an exposure light is emitted; a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a second surface that is disposed in at least a part of a surrounding of the first surface and at a position lower than the first surface; a space portion into which a liquid can flow via a first aperture between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture; and a first recovery portion that recovers at least a part of the liquid flowing into the space portion. Here, the emission surface, the first surface, and the second surface are opposed to the surface of the substrate in at least a part of the exposure of the substrate, and the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate.

Title
Exposure apparatus, exposure method, and device manufacturing method
Application Number
12/644703
Publication Number
8896806 (B2)
Application Date
December 22, 2009
Publication Date
November 25, 2014
Inventor
Shinji Sato
Fukaya
JP
Agent
Oliff
Assignee
Nikon Corporation
JP
IPC
G03B 27/52
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