08743373 is referenced by 1 patents and cites 56 patents.

An interferometry method and associated system and computerized media for testing samples under test including those with high aberrations, comprising: situating a sample under test between a tilt mirror and a reference mirror, the tilt mirror tiltable with at least one degree of freedom about at least one tilt mirror axis, and further translatable along an axial line defined by a direction of propagation of a test wavefront from a source thereof; propagating the test wavefront toward the tilt mirror; after the test wavefront has been reflected by the tilt mirror, further propagating the test wavefront toward a reference mirror; and deriving a substantially complete first-tilt-alignment wavefront metrology of the sample under test from a plurality of first-tilt-alignment interferograms taken with the tilt mirror held fixed at a first predetermined tilt mirror angle while discreetly varying a displacement between the sample under test and the reference mirror.

Title
Metrology of optics with high aberrations
Application Number
13/225467
Publication Number
8743373 (B1)
Application Date
September 4, 2011
Publication Date
June 3, 2014
Inventor
Xu Ming Wang
Albany
NY, US
Mikhail Gutin
Albany
NY, US
Agent
Jay R Yablon
Assignee
Applied Science Innovations
NY, US
IPC
G01B 11/02
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