08717533 is referenced by 8 patents and cites 130 patents.

A lithographic projection projects a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate. The space is smaller in plan than the substrate. The apparatus includes a plate substantially parallel to the substrate to divide the space into two parts, the plate having an aperture to allow transmission of the pattern onto the substrate.

Title
Exposure apparatus, exposure method, and method for producing device
Application Number
11/802060
Publication Number
8717533 (B2)
Application Date
May 18, 2007
Publication Date
May 6, 2014
Inventor
Takeshi Okuyama
Yokohama
JP
Hiroyuki Nagasaka
Kumagaya
JP
Agent
Oliff
Assignee
Nikon Engineering
JP
Nikon Corporation
JP
IPC
G03B 27/52
G03B 27/42
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