08634053 is referenced by 8 patents and cites 130 patents.

A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

Title
Lithographic apparatus and device manufacturing method
Application Number
11/987569
Publication Number
8634053 (B2)
Application Date
November 30, 2007
Publication Date
January 21, 2014
Inventor
Joris Johan Anne Marie Verstraete
Waalre
NL
Patrick Johannes Wilhelmus Spruytenburg
Eindhoven
NL
Marcio Alexandre Cano Miranda
Waalre
NL
Christophe De Metsenaere
Eindhoven
NL
Mathieus Anna Karel Van Lierop
Eindhoven
NL
Han Henricus Aldegonda Lempens
Weert
NL
Koen Steffens
Veldhoven
NL
Gert Jan Gerardus Johannes Thomas Brands
Waalre
NL
Eva Mondt
Eindhoven
NL
Paul Petrus Joannes Berkvens
Veldhoven
NL
Daniel Jozef Maria Direcks
Simpelveld
NL
Wilhelmus Franciscus Johannes Simons
Beesel
NL
Ronald Van Der Ham
Maarheeze
NL
Paulus Martinus Maria Liebregts
Veldhoven
NL
Christiaan Alexander Hoogendam
Westerhoven
NL
Michel Riepen
Veldhoven
NL
Agent
Pillsbury Winthrop Shaw Pittman
Assignee
ASML Netherlands
NL
IPC
G03B 27/52
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