08614784 is referenced by 8 patents and cites 20 patents.

A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, one or more openings in a third line and a second gas knife device having an aperture in a fourth line.

Title
Fluid handling structure, lithographic apparatus and device manufacturing method, involving gas supply
Application Number
12/886956
Publication Number
8614784 (B2)
Application Date
September 21, 2010
Publication Date
December 24, 2013
Inventor
Fabrizio Evangelista
Eindhoven
NL
Ralph Joseph Meijers
Kerkrade
NL
Rogier Hendrikus Magdalena Cortie
Ittervoort
NL
Johannes Catharinus Hubertus Mulkens
Valkenswaard
NL
Nicolaas Rudolf Kemper
Eindhoven
NL
Michel Riepen
Veldhoven
NL
Agent
Pillsbury Winthrop Shaw Pittman
Assignee
ASML Netherlands
NL
IPC
G03B 27/32
G03B 27/52
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