08610873 is referenced by 18 patents and cites 16 patents.

An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surface and the final optical element. A liquid confinement member maintains the immersion liquid in the gap. The immersion liquid has a meniscus where the liquid contacts ambient gas, the meniscus defining a footprint of an immersion area. A movable liquid diverter is positioned between the liquid confinement member and the stage. The movable liquid diverter moves relative to the liquid confinement member in a direction parallel to the surface of the stage, and includes an opening that surrounds the immersion area, the opening contacting or being slightly spaced from the immersion area when the stage is stationary.

Title
Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
Application Number
12/382100
Publication Number
8610873 (B2)
Application Date
March 9, 2009
Publication Date
December 17, 2013
Inventor
Daishi Tanaka
Kumagaya
JP
Gaurav Keswani
Fremont
CA, US
Derek Coon
Redwood City
CA, US
Leonard Wai Fung Kho
San Francisco
CA, US
Alex Ka Tim Poon
San Ramon
CA, US
Agent
Oliff & Berridge
Assignee
Nikon Corporation
JP
IPC
G03B 27/52
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