08536059 is referenced by 1 patents and cites 172 patents.

Etching equipment and methods are disclosed herein for more efficient etching of sacrificial material from between permanent MEMS structures. An etching head includes an elongate etchant inlet structure, which may be slot-shaped or an elongate distribution of inlet holes. A substrate is supported in proximity to the etching head in a manner that defines a flow path substantially parallel to the substrate face, and permits relative motion for the etching head to scan across the substrate.

Title
Equipment and methods for etching of MEMS
Application Number
12/527864
Publication Number
8536059 (B2)
Application Date
February 18, 2008
Publication Date
September 17, 2013
Inventor
Philip Don Floyd
Redwood City
CA, US
Ana R Londergan
Santa Clara
CA, US
David Heald
Solvang
CA, US
Marc Maurice Mignard
San Jose
CA, US
Evgeni Gousev
Saratoga
CA, US
Khurshid Syed Alam
Mountain View
CA, US
Agent
Knobbe Martens Olson & Bear
Assignee
QUALCOMM MEMS Technologies
CA, US
IPC
H01L 21/461
H01L 21/302
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